EUV Light Generation System Actuator Mirror Alignment
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Solution Overview
Problem
Current EUV light generation systems face challenges in efficiently directing and measuring EUV light, leading to increased downtime and difficulty in detecting abnormalities in the EUV light profile, especially when the light does not meet required conditions, as they lack flexible adjustment mechanisms and real-time measurement capabilities.
Innovation Solution
The system incorporates a planar mirror with an actuator that switches between two positions, allowing the EUV light to be directed to either an external apparatus or a measurement unit, enabling real-time adjustment and calibration to ensure the EUV light meets specified conditions, thereby reducing downtime and facilitating the identification of issues.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If EUV light is directed directly to external apparatus without measurement capability, then the system structure is simple, but the ability to detect and measure EUV light profile abnormalities is insufficient
Solution Approach 1:
The planar mirror is made movable by an actuator, allowing dynamic switching between two positions. This enables the system to alternate between measurement mode (directing EUV light to measurement unit) and operation mode (directing EUV light to external apparatus), providing real-time measurement capability without permanent complex routing structures.
Solution Approach 2:
The planar mirror serves as an intermediary element that redirects EUV light between different destinations. By positioning the mirror at a strategic location in the optical path, it can steer light to either the measurement unit or the external apparatus, enabling measurement functionality without requiring direct permanent connection to both destinations simultaneously.
2Loss of time
If the system lacks real-time measurement capability, then the device complexity is low, but the downtime increases when EUV light does not meet required conditions
Solution Approach 1:
The system enables continuous useful action by allowing rapid switching between measurement and operation modes. The actuator can quickly reposition the planar mirror to redirect EUV light, minimizing interruption time. This ensures that measurement activities can be performed without permanently halting the operational workflow.
Solution Approach 2:
The measurement unit is positioned and ready in advance to receive EUV light when the planar mirror is switched to the measurement position. This preliminary preparation allows immediate measurement when needed, reducing the time required to detect and respond to EUV light profile abnormalities.
3Adaptability or versatility
If no switching mechanism is provided, then the ease of operation is high, but the adaptability to switch between measurement and operation modes is poor
Solution Approach 1:
The actuator automatically positions the planar mirror based on control signals, eliminating the need for manual intervention to switch between measurement and operation modes. The system self-manages the switching operation, improving ease of use while maintaining high adaptability.
Solution Approach 2:
The planar mirror serves multiple functions: it can direct EUV light to the measurement unit for profile analysis or to the external apparatus for normal operation. This single component performs both measurement routing and operational routing, providing versatility without requiring separate dedicated components for each function.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for accurate alignment and measurement of EUV light, reducing downtime by enabling continuous operation even when the light does not meet initial conditions, and allows for the identification and correction of issues without disconnecting the system from the external apparatus.
Implementation Method 1
an EUV light concentrating mirror configured to concentrate, on a second point, extreme ultraviolet light generated at the first point
Implementation Method 2
a planar mirror arranged on an optical path of the extreme ultraviolet light reflected by the EUV light concentrating mirror and between the first and second points
Data Source
AI summary
An extreme ultraviolet light generation system includes a chamber, a target supply unit supplying a target substance to a plasma generation region including a first point in the chamber, a window allowing pulse laser light with which the target substance is irradiated to pass therethrough, an EUV light concentrating mirror concentrating extreme ultraviolet light generated at the first point on a second point, a planar mirror arranged on an optical path of the extreme ultraviolet light reflected by the EUV light concentrating mirror and between the first and second points, an actuator causing the second point to be switched between a first position and a second position, a connection portion connectable to an external apparatus, a first EUV measurement unit on which the extreme ultraviolet light having passed through the second position is incident, and a processor controlling the actuator based on a signal from the external apparatus.