EUV Light Generation System Mist Diameter Control
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Solution Overview
Problem
In extreme ultraviolet light generation systems, the variation in mist target diameter due to changes in dispersion velocity and target position leads to instability in EUV light energy, affecting the efficiency of microfabrication processes for semiconductor production.
Innovation Solution
An extreme ultraviolet light generation system that measures the mist diameter of the target and controls either the energy of the first pulse laser beam or the timing of the second pulse laser beam to maintain consistent mist diameter, thereby stabilizing EUV light energy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the target is irradiated with a pulse laser beam to generate EUV light, then EUV light is produced for semiconductor microfabrication, but variations in mist target diameter and dispersion velocity cause instability in EUV light energy
Solution Approach 1:
The system measures the actual diameter of the mist target using an image measurement device and feeds this information back to the control unit. The control unit then adjusts the energy of the first pre-pulse laser beam or the timing of the second pre-pulse laser beam based on this feedback to maintain the mist target diameter within a predetermined range, thereby stabilizing EUV light energy output
Solution Approach 2:
The system dynamically changes operational parameters (energy of the first pre-pulse laser beam or timing of the second pre-pulse laser beam) in response to measured mist target diameter variations. By adjusting these parameters, the system maintains optimal mist target conditions for stable EUV light generation despite variations in dispersion velocity or target position
2Power
If the energy of the first pulse laser beam is increased to improve plasma generation, then EUV light output increases, but mist target diameter varies due to changes in dispersion velocity
Solution Approach 1:
The control unit receives measurement data on mist target diameter from the image measurement device and uses this feedback to adjust the energy of the first pre-pulse laser beam. This closed-loop control ensures that even when laser energy is increased to improve EUV output, the mist target diameter remains stable by compensating for any dispersion velocity changes
Solution Approach 2:
The system transitions from a static laser energy setting to a dynamic adjustment mechanism where the first pre-pulse laser beam energy is continuously adapted based on real-time mist target diameter measurements. This dynamic control allows the system to maintain stable mist formation while achieving high EUV light output
3Productivity
If the timing of the second pulse laser beam is adjusted to optimize plasma generation, then EUV light efficiency improves, but mist target diameter stability is compromised
Solution Approach 1:
The control unit measures the mist target diameter and uses this feedback to precisely adjust the timing of the second pre-pulse laser beam. This ensures that the laser beam always strikes the mist target at the optimal moment, maintaining both high EUV generation efficiency and stable mist target diameter
Solution Approach 2:
The system performs preliminary measurement of the mist target diameter before the second pre-pulse laser beam irradiation. Based on this preliminary information, the control unit pre-adjusts the timing of the second laser beam to ensure optimal plasma generation conditions are met while maintaining mist target stability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach prevents variations in mist diameter and EUV light energy, enhancing the stability and efficiency of EUV light generation for microfabrication processes, particularly in semiconductor production with feature sizes below 32 nm.
Implementation Method 1
The laser system is configured to irradiate the first target with a first pulse laser beam to break and disperse the first target and produce a mist target
Implementation Method 2
extreme ultraviolet light generation system configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam for a plurality of times to change the target into plasma
Data Source
AI summary
An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. The controller may measure a mist diameter of the mist target and control, based on the mist diameter, at least one of time to emit the second pulse laser beam and energy of a first pulse laser beam to be used to irradiate the second target.