EUV Multi-Mirror Arrangement for Precise Piezoelectric Tilt Control
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Solution Overview
Problem
Conventional multi-mirror arrangements for EUV lithography face complex production processes and are sensitive to thermal fluctuations, limiting their ability to achieve large tilt angles and maintain high positioning accuracy under thermal loads.
Innovation Solution
An EUV multi-mirror arrangement with a piezoelectric actuator system and capacitive sensor system, integrated with a suspension system, allowing for large tilt angles and improved thermal dissipation, using MEMS technologies for production.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional multi-mirror arrangements are used, then production processes become complex, but positioning accuracy and thermal stability are compromised
Solution Approach 1:
The multi-mirror arrangement is divided into multiple independent mirror modules, each with its own actuator system. This segmentation allows for simplified manufacturing of individual modules while maintaining high positioning accuracy through modular assembly. Each module can be produced separately using standard MEMS processes, reducing overall production complexity.
Solution Approach 2:
The patent replaces complex mechanical positioning systems with piezoelectric actuators that use electrical fields to control mirror tilt angles. This substitution eliminates complex mechanical linkages and reduces production complexity while achieving high positioning accuracy through precise electrical control of the piezoelectric elements.
2Adaptability or versatility
If large tilt angles are achieved, then illumination flexibility is improved, but thermal sensitivity increases
Solution Approach 1:
The patent uses piezoelectric actuators whose operating characteristics can be adjusted through electrical parameter changes. By controlling the voltage applied to the piezoelectric elements, large tilt angles can be achieved while the system remains less sensitive to thermal fluctuations compared to mechanical systems. The electrical control parameters can be optimized to compensate for thermal effects.
Solution Approach 2:
The mirror modules incorporate composite structures combining materials with different thermal expansion properties. This composite construction reduces thermal sensitivity while allowing the mirror elements to achieve large tilt angles. The composite materials compensate for thermal distortion, maintaining positioning accuracy despite temperature variations.
3Area of stationary object
If mirror elements are densely packed, then area utilization is improved, but thermal dissipation becomes difficult
Solution Approach 1:
The patent employs thin-film piezoelectric actuators and flexible suspension structures that allow for dense packing of mirror elements. These thin-film structures have low thermal mass and high surface-area-to-volume ratios, facilitating efficient heat dissipation even when mirrors are closely spaced. The flexible films maintain structural integrity while enabling thermal management.
Solution Approach 2:
The patent introduces thermal management intermediaries such as heat sinks and thermal conduction pathways between densely packed mirror elements. These intermediary structures facilitate heat transfer from the mirror backings to cooling systems, allowing high area utilization while maintaining effective thermal dissipation through the intermediary thermal management components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables simple production, high tilt angles, and reduced sensitivity to temperature fluctuations, ensuring precise positioning and effective thermal management in EUV lithography systems.
Implementation Method 1
at least one piezoelectric actuator for modifying an orientation of the mirror element in relation to the base element
Implementation Method 2
at least one capacitive sensor for detecting a position of the mirror element in relation to the base element
Implementation Method 3
The suspension system has at least one connection element group for supporting the mirror element
Data Source
AI summary
An EUV multi-mirror arrangement comprises a multiplicity of mirror units arranged one next to the other in a grid arrangement on a carrier structure. Each mirror unit has a base element and, opposite the base element, an individually tiltable mirror element which has a mirror substrate that carries on a front face facing away from the base element a reflection coating for forming a mirror surface that reflects EUV radiation. Arranged between its base element and the mirror element, each mirror unit includes components of a suspension system for movably mounting the mirror element on the base element, actuators of an actuator system for producing movements of the mirror element in relation to the base element as a reaction to the reception of control signals, and sensors of a sensor system for capturing the position of the mirror elements. The actuator system has piezoelectric actuators. The sensor system has capacitive sensors.