EUV Light Source Gas Jet Nozzle Segmentation and Recycling
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Solution Overview
Problem
Existing EUV light source devices using laser-produced plasma have complex structures, leading to high production costs and inefficiencies in generating high-quality EUV light.
Innovation Solution
The EUV light source device incorporates a simplified gas jet nozzle structure with injection parts that generate shock waves, focusing the plasma reaction gas to enhance EUV light generation efficiency, and includes a recycling system to reuse plasma reaction gas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a conventional gas jet nozzle structure is used, then the EUV light source device can generate plasma, but the structure becomes complex and production costs increase
Solution Approach 1:
The gas jet nozzle is divided into multiple gas injectors (first gas injector, second gas injector, third gas injector) that independently supply different gases (hydrogen, deuterium, or helium) to the plasma generation region. This segmentation allows each injector to be optimized for specific gas delivery while maintaining overall system simplicity and reducing production costs.
Solution Approach 2:
The gas jet nozzle structure is designed to be universal by accommodating multiple gas types (hydrogen, deuterium, helium) through configurable injectors. The same nozzle structure can deliver different gases by adjusting which injectors are active, eliminating the need for multiple specialized nozzle designs and reducing overall system complexity.
2Power
If conventional laser-produced plasma methods are used, then EUV light can be generated, but the conversion efficiency remains insufficient
Solution Approach 1:
Different regions of the plasma generation chamber have optimized gas concentrations and compositions. The first gas injector provides high gas concentration near the laser focus point for efficient plasma generation, while the second and third injectors provide additional gases at different locations to optimize EUV light output and manage plasma density distribution for improved conversion efficiency.
Solution Approach 2:
The system dynamically adjusts gas flow rates, pressures, and compositions by controlling multiple gas injectors. By changing parameters such as hydrogen/deuterium/helium ratios and flow rates, the plasma conditions are optimized to maximize EUV light conversion efficiency while maintaining high power output.
3Productivity
If plasma reaction gas is continuously consumed, then the plasma reaction can proceed, but production costs increase due to gas replacement needs
Solution Approach 1:
The system implements a gas recovery mechanism where unreacted plasma reaction gas is collected and recycled back into the plasma generation chamber. This reduces gas consumption and production costs while maintaining continuous plasma reaction productivity.
Solution Approach 2:
Multiple gas injectors provide continuous gas supply to maintain steady plasma conditions. The system ensures uninterrupted plasma reaction by continuously replenishing consumed gas through coordinated injection from multiple sources, maintaining productivity without complete gas replacement cycles.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device generates high-quality EUV light with improved resolution and reduced production costs by simplifying the gas jet nozzle structure and recycling the plasma reaction gas.
Implementation Method 1
an EUV light source device using laser-produced plasma
Implementation Method 2
injection parts that generate shock waves, focusing the plasma reaction gas
Implementation Method 3
forming a plasma using the laser beam and the reaction gas, and generating EUV light
Data Source
AI summary
An extreme ultraviolet (EUV) light source device for generating EUV light through a plasma reaction, includes: a focusing lens for focusing a laser beam generated from a laser source; a vacuum chamber for providing a vacuum environment to generate the laser beam focused on the focusing lens as the EUV light through the plasma reaction; a gas jet nozzle for supplying a plasma reaction gas to the laser beam focused on the focusing lens to generate the EUV light; and a gas supply part for supplying the plasma reaction gas to the gas jet nozzle from the outside.