EUV Nozzle Support Structure for Capillary Vibration Stability
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Solution Overview
Problem
Existing nozzle apparatuses in EUV light sources suffer from unintentional vibrations of capillary tubes, leading to pointing instability and reduced or no plasma production, which affects the generation of extreme ultraviolet light.
Innovation Solution
A nozzle apparatus with a support structure that includes a first and second support portion, coupled with an electro-mechanical actuator, to stabilize the capillary tube and reduce unintentional vibrations, allowing controlled intentional vibrations for targeted droplet formation and coalescence.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a capillary tube is used in EUV light source nozzle apparatus, then EUV light generation is enabled, but unintentional vibrations occur causing pointing instability
Solution Approach 1:
The patent changes the mechanical parameters of the capillary tube by adding support structures at specific positions along the tube. This modifies the tube's vibrational characteristics and structural stability without changing its fundamental function, thereby reducing unintentional vibrations while maintaining plasma production capability
Solution Approach 2:
The patent introduces support structures as intermediary elements between the capillary tube and the surrounding environment. These support structures act as mediators that provide mechanical stabilization to the tube, reducing vibrations while allowing the tube to maintain its essential function of delivering target material for plasma generation
2Stability of the object's composition
If support structure is added to stabilize capillary tube, then vibration is reduced, but device complexity increases
Solution Approach 1:
The support structure is segmented into multiple discrete support portions positioned at different locations along the capillary tube. This segmentation allows for targeted stabilization at critical points while maintaining simplicity in other areas, balancing vibration reduction with device complexity management
Solution Approach 2:
The patent applies partial support rather than complete encasement of the capillary tube. By providing support only where needed to reduce vibrations, the design achieves stability improvement without the excessive complexity that would result from fully enclosing or extensively bracing the entire tube structure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively reduces unintentional vibrations, ensuring precise targeting and efficient EUV light generation by maintaining the stability of the capillary tube, thereby enhancing the production of EUV light in plasma formation.
Implementation Method 1
an electro-mechanical actuator in contact with the tube and configured to impart mechanical motion into the tube
Implementation Method 2
converting a material that includes an element, for example, xenon, lithium, or tin, with an emission line in the EUV range in a plasma state. In one such method, often termed laser produced plasma (LPP), the required plasma may be produced by irradiating a target material
Data Source
AI summary
An apparatus includes: a tube; a body including: a first body wall and a second body wall; and a support structure including: a first support portion and a second support portion. The first body wall extends in a first direction, the second body wall extends in a second direction that is different than the first direction, a first portion of the tube passes through an opening in the second body wall the first support portion is configured to attach to the first body wall, and a second portion of the tube is configured to pass through the second support portion when the first support portion is attached to the first body wall. An interior of the tube and an interior of the body are configured to receive molten target material, and the target material emits extreme ultraviolet (EUV) light when in a plasma state.