EUV Optical Device Beam Path Alignment and Adjustment
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Solution Overview
Problem
Current semiconductor production processes face challenges in generating extreme ultraviolet (EUV) light with the required precision and efficiency for microfabrication at feature sizes below 32 nm, particularly in aligning and adjusting the beam paths of laser beams to achieve optimal EUV light generation.
Innovation Solution
An optical device and EUV light generation system that includes a mirror configuration to reflect and transmit laser beams in parallel or coinciding paths, with beam parameter measuring and adjusting units to optimize the beam paths and parameters of both pre-pulse and main pulse laser beams, ensuring precise overlap and focusing within the system.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a mirror is used to reflect and transmit laser beams in parallel paths, then beam alignment precision is improved, but device complexity increases due to additional optical components
Solution Approach 1:
The patent divides the laser beam into separate paths using a beam splitter, creating distinct measurement and reference beams that travel through different optical paths. This segmentation allows independent adjustment and measurement of each beam path, improving alignment precision while managing complexity through modular design
Solution Approach 2:
The patent introduces a beam splitter as an intermediary component that separates the incoming laser beam into multiple paths. This mediator enables precise control and measurement of individual beam parameters without requiring direct manipulation of the original beam, thus improving alignment precision while maintaining manageable device complexity
2Manufacturing precision
If beam parameter measuring units are added to adjust laser beams, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent implements feedback control by using beam parameter measuring units to detect deviations in laser beam characteristics and automatically adjusting the beam parameters to correct these deviations. This closed-loop feedback system ensures high manufacturing precision for microfabrication while managing device complexity through automated control
Solution Approach 2:
The patent replaces manual mechanical adjustment mechanisms with automated beam parameter adjusting units that use electronic control and feedback signals. This substitution improves manufacturing precision through consistent automated adjustment while reducing the complexity associated with manual mechanical systems
3Productivity
If multiple laser beams are aligned in parallel paths, then EUV light generation efficiency is improved, but system size increases
Solution Approach 1:
The patent merges multiple laser beam paths into a compact configuration using optical elements that allow parallel beams to coexist in a reduced spatial footprint. This merging approach maintains the efficiency benefits of multiple beams while minimizing the overall system size through clever optical path integration
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for precise adjustment and alignment of laser beams, enhancing the generation and focusing of EUV light, improving the efficiency and accuracy of microfabrication processes, and reducing the system's size and component count while maintaining beam stability.
Implementation Method 1
a mirror configured to reflect part of a first laser beam incident on one principal surface thereof as a first reflected beam and transmit the other part of the first laser beam through the mirror as a first transmitted beam
Implementation Method 2
transmit the other part of the first laser beam through the mirror as a first transmitted beam
Implementation Method 3
an optical system disposed so that the first and second laser beams are incident on the mirror such that a beam path of the first transmitted beam and a beam path of the second reflected beam are made to be parallel to each other or to substantially coincide with each other
Data Source
Figure 1
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AI summary
An optical device ( 100 ) may include a mirror ( 30 ) for respectively reflecting and transmitting parts of a first laser beam ( L2 ) as first reflected and first transmitted beams, and for respectively transmitting and reflecting parts of a second laser beam ( L3 ) as second transmitted and second reflected beams; an optical system disposed so that the first and second laser beams are such that beam paths of the first transmitted and second reflected beams are parallel or substantially coincide, or such that beam paths of the first reflected and second transmitted beams are parallel or substantially coincide; first and second measuring units (D31; D32 ) configured to respectively measure a beam parameter of the first transmitted or first reflected beams, and of the second reflected or second transmitted beams; and first and second adjusting units ( 11; 21 ) configured to adjust the first and second laser beams based on measurement results by the measuring units.