EUV Optical Module Correction for Residual Aberrations
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
EUV microlithography apparatuses are complex and costly, requiring reliable operation with minimal downtime for maintenance, yet existing methods struggle to efficiently correct residual aberrations in optical imaging systems.
Innovation Solution
Implement an exchangeable optical module with a correction mirror, using a tool mirror to establish an auxiliary imaging system, perform system measurements, and adjust the correction mirror's surface shape to reduce aberrations, allowing for efficient production and commissioning with minimal downtime.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If an exchangeable optical module with correction mirror is used, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The optical imaging system is divided into modular optical modules that can be independently exchanged. Each module contains a mirror and can be replaced without affecting other modules, enabling precise correction of residual aberrations while maintaining overall system manageability
Solution Approach 2:
A correction mirror is introduced as an intermediary element within the optical module. This correction mirror specifically addresses residual aberrations by providing additional optical correction capability, improving imaging quality without requiring complete system redesign
2Manufacturing precision
If system measurements and correction mirror adjustment are performed, then manufacturing precision is improved, but loss of time increases
Solution Approach 1:
The correction mirror is pre-configured with adjustment capabilities that allow for rapid correction during commissioning. The optical modules are designed to accommodate adjustment mechanisms that can be quickly modified based on measurement results, reducing the time required for precision correction
Solution Approach 2:
System measurements provide feedback on residual aberrations, which guides the adjustment of the correction mirror. This closed-loop approach ensures that corrections are made efficiently based on actual measured deviations, minimizing iterative adjustments and commissioning time
3Ease of repair
If exchangeable optical modules are used, then ease of repair is improved, but device complexity increases
Solution Approach 1:
The optical system is segmented into interchangeable modules that can be independently maintained and replaced. This modular architecture simplifies repair operations by allowing technicians to exchange specific modules without disassembling the entire system, improving maintenance efficiency
Solution Approach 2:
Optical modules can be exchanged between different microlithography apparatuses, allowing recovered modules from one system to be used in another. This extends the service life of optical components and simplifies maintenance by enabling module redistribution across multiple systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method ensures the optical imaging system meets specifications with reduced downtime by using a correction mirror to correct residual aberrations, optimizing imaging quality and resource utilization.
Implementation Method 1
adjust the correction mirror's surface shape to reduce aberrations
Implementation Method 2
imaging systems for EUV microlithography apparatuses use only mirrors to image structures from the object plane into the image plane
Data Source
AI summary
A method for producing an optical imaging system for an EUV microlithography apparatus, and a related optical system and apparatus.