EUV Light Generating Apparatus Optical Path Alignment
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Solution Overview
Problem
Current extreme ultraviolet light generating apparatuses face challenges in maintaining stable EUV light energy and optical path alignment due to thermal deformation of optical elements, leading to reduced EUV light generation efficiency and accuracy in micro-fabrication processes, especially at sub-32 nm scales.
Innovation Solution
The apparatus incorporates a high-speed actuator and a beam combiner module with multiple actuators to precisely adjust the optical path of pre-pulse and main pulse laser beams, stabilizing the EUV light generation by controlling the position and posture of reflective mirrors and optical systems based on real-time data from sensors, ensuring optimal irradiation conditions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If high-repetition frequency laser beams are used for EUV light generation, then productivity is improved, but thermal deformation of optical elements increases causing optical path misalignment
Solution Approach 1:
The patent employs sensors to detect the actual positions of optical elements and feeds this information back to actuators that adjust mirror and lens positions in real-time, compensating for thermal deformation and maintaining precise optical path alignment during high-repetition frequency operation
Solution Approach 2:
The patent introduces dynamically adjustable optical elements with actuators that can change their positions and orientations in response to thermal conditions, transforming static optical components into dynamic systems that adapt to thermal deformation during high-power laser operation
2Use of energy by moving object
If multiple laser beams are combined for plasma generation, then EUV light energy is improved, but optical path alignment complexity increases
Solution Approach 1:
The patent combines multiple laser beams (pre-pulse and main pulse) into a single optical path using beam combiners and mirrors, merging their energies at the target while maintaining independent control of each beam's parameters to achieve high EUV light energy output
Solution Approach 2:
The patent employs universal optical components such as beam combiners and adjustable mirrors that can handle multiple laser beams with different parameters, providing a multi-functional platform that manages complex optical path alignment through standardized interfaces and control mechanisms
3Manufacturing precision
If pre-pulse laser is used to generate secondary target, then EUV light generation accuracy is improved, but optical path control difficulty increases
Solution Approach 1:
The patent uses a pre-pulse laser to create a secondary target structure before the main pulse arrives, performing preliminary shaping of the target material to optimize plasma generation and EUV light emission accuracy
Solution Approach 2:
The patent replaces manual optical alignment procedures with automated actuator systems controlled by sensors and feedback loops, substituting mechanical adjustment operations with automated control mechanisms that precisely manage the optical paths of both pre-pulse and main pulse lasers
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution stabilizes EUV light energy and maintains precise optical path alignment, enhancing the efficiency and accuracy of EUV light generation, even in high-repetition frequency bursts, thereby supporting advanced micro-fabrication processes at sub-32 nm scales.
Implementation Method 1
a first pulse laser beam with which a target is irradiated at a predetermined region to generate a secondary target
Implementation Method 2
a second pulse laser beam with which the secondary target is irradiated at the predetermined region to generate plasma
Implementation Method 3
a mirror configured to reflect the first pulse laser beam
Implementation Method 4
a beam combiner configured to cause optical paths of the first pulse laser beam reflected by the mirror and the second pulse laser beam to substantially coincide with each other
Data Source
AI summary
An extreme ultraviolet light generating apparatus may include a chamber including a window to allow first and second pulse laser beams to enter, a mirror to reflect the first pulse laser beam, a first actuator to control a position or a posture of the mirror, a beam combiner to cause optical paths of the first and second pulse laser beams to substantially coincide with each other, a reflective optical system to reflect the first and second pulse laser beams from the beam combiner, a second actuator to control a position or a posture of the reflective optical system, sensors each configured to output data for detecting a position of an optical path of the first pulse laser beam, and a controller to control the first actuator based on the data and control the second actuator based on a value related to control of the first actuator.