EUV Lithography Optical Assembly Purge Gas Flow Control

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Solution Overview

Problem

Existing optical assemblies used in EUV lithography systems face challenges in effectively purging fastening areas of optical elements, leading to contamination and potential damage from moisture, especially when using small purge gas flows.

Innovation Solution

An optical assembly with a flow guiding element, typically made of metallic materials like stainless steel, is integrated to cover the interstice between the optical element and the mount, allowing a controlled purge gas flow that protects the fastening areas from environmental influences while minimizing the amount of purge gas required.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If a purge gas flow is used to protect the fastening areas of optical elements, then contamination from moisture is prevented, but the amount of purge gas required increases significantly

Engineering Contradiction:
Improvecontamination of fastening areasVSAvoidamount of purge gas
Core Design Contradiction:
Object-affected harmful factorsVSQuantity of substance

Solution Approach 1:

The patent applies local quality by directing the purge gas flow specifically to the fastening areas of the optical element rather than uniformly across the entire optical surface. The gas flow is localized to where contamination risk exists (fastening areas with adhesives), reducing the total purge gas volume while maintaining protection where needed. This is achieved through careful positioning of gas nozzles and shaping the gas flow path to concentrate protection at the mount-optical element interface.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent segments the optical element into distinct regions: the optically active surface and the fastening areas. By separating these functional zones, the purging strategy can be optimized differently for each - the optically active surface receives minimal or no purge gas, while the fastening areas receive targeted protection. This segmentation allows reduction of overall purge gas consumption while maintaining protection where required.

Inventive Principle:
Principle #1Segmentation

2Strength

If the optical element is laterally clamped by fastening elements, then secure fastening is achieved, but the fastening areas become exposed to ambient moisture and contamination

Engineering Contradiction:
Improvefastening strengthVSAvoidexposure to moisture
Core Design Contradiction:
StrengthVSObject-affected harmful factors

Solution Approach 1:

The patent applies preliminary anti-action by introducing a purge gas flow that actively counteracts moisture and contamination before they can reach and damage the fastening areas. The gas flow is directed along the lateral surfaces of the fastening elements and at the interface between the mount and optical element, creating a protective barrier that prevents environmental contaminants from contacting the adhesive bonds and fastening surfaces.

Inventive Principle:
Principle #9Preliminary anti-action

Solution Approach 2:

The purge gas acts as an intermediary substance between the ambient environment and the fastening areas. It creates a protective atmosphere that mediates the interaction between moisture/contaminants and the sensitive fastening regions, allowing the fastening structure to remain exposed mechanically while being protected chemically/environmentally by the gas flow barrier.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Reliability

If a large purge gas volume is used to ensure complete protection, then all surfaces are protected, but system complexity and gas consumption increase

Engineering Contradiction:
Improveprotection effectivenessVSAvoidpurge system complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies partial action by providing purge gas protection only where it is actually needed - specifically at the fastening areas and mount interfaces - rather than uniformly across all optical surfaces. This selective approach achieves sufficient reliability for protection while avoiding the excessive gas consumption and system complexity that would result from comprehensive uniform protection of all surfaces.

Inventive Principle:
Principle #16Partial or excessive action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution significantly reduces the amount of purge gas needed while maintaining effective protection of the fastening areas, achieving a high protection factor against contamination and preventing deformation of the optical elements due to moisture exposure.

Implementation Method 1

a purging device arranged to produce at least one purge gas flow in the region of the optical element, such that the purge gas flow flows around the fastening areas of the fastening elements

Methodology Applied
Scientific EffectGas flow:

Data Source

PatentUS10146048B2Optical assembly, projection system, metrology system and EUV lithography apparatus
Publication Date: 2018.12.04 CARL ZEISS SMT GMBH
  • US10146048B2 patent drawing
  • US10146048B2 patent drawing
  • US10146048B2 patent drawing

AI summary

An optical assembly (1) includes an optical element (2), a mount (3) configured to hold the optical element (2), and a plurality of fastening elements (12) with fastening areas (14) configured to fasten the optical element (2) to the mount (3). The fastening elements (12) bridge an interstice (11) between the optical element (2) and the mount (3), and a purge device (15) produces at least one purge gas flow (16) in the region of the optical element (2) such that the purge gas flow flows around the fastening areas (14) of the fastening elements (12).