EUV Optics Module Hydrogen Cleaning for Extended Operating Time
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Solution Overview
Problem
EUV projection exposure apparatuses face challenges in maintaining prolonged operating times due to the formation of activated hydrogen species that can degrade optical components, necessitating effective cleaning methods.
Innovation Solution
The introduction of a gas source system that provides controlled partial pressures of hydrogen and its isotopes, along with other gases like nitrogen and oxygen, to generate activated species for cleaning optical surfaces, combined with closed-loop control of gas addition and pressure sensors to optimize the environment within the reduced-pressure chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If EUV projection exposure apparatus operates for extended periods, then productivity increases, but optical components degrade due to activated hydrogen species formation
Solution Approach 1:
The patent converts the harmful effect of hydrogen species by introducing controlled amounts of hydrogen gas into the vacuum chamber. The hydrogen undergoes dissociative attachment to form H2- ions, which are then used to clean optical surfaces through controlled sputtering, transforming the degradation mechanism into a beneficial cleaning process that extends operational life
Solution Approach 2:
The system dynamically adjusts the partial pressure of hydrogen gas and the energy parameters of the ion beam to optimize cleaning effectiveness while minimizing damage to optical components. By controlling the hydrogen pressure between 10^-6 to 10^-3 mbar and adjusting ion energy, the system maintains reliable operation over extended periods
2Manufacturing precision
If gas source is introduced to generate activated hydrogen species for cleaning, then optical surface cleaning effectiveness improves, but system complexity increases
Solution Approach 1:
The patent introduces hydrogen gas as an intermediary substance that facilitates the cleaning process. The hydrogen molecules serve as mediators between the ion source and optical surfaces, enabling controlled cleaning through dissociative attachment without requiring direct contact between cleaning mechanisms and delicate optical components
Solution Approach 2:
The system uses gas pressure control mechanisms to deliver precise amounts of hydrogen gas to the vacuum chamber. Through pneumatic control of gas flow and pressure, the system achieves effective optical surface cleaning while maintaining manageable system complexity through standardized gas handling components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly extends the operating time of EUV optics modules by effectively cleaning optical components and reducing degradation, ensuring consistent performance.
Implementation Method 1
In a process called dissociative attachment, a neutral molecule captures an electron and subsequently breaks up into a negative ion and a neutral atom
Implementation Method 2
A source region is provided in which electrons are accelerated to a high energy and directed at a hydrogen gas
Implementation Method 3
an optical multilayer system for reflection of a used radiation with a wavelength of 13.5 nm
Implementation Method 4
optical multilayer system comprising a multiplicity of layers
Data Source
AI summary
An EUV optics module (35) for an EUV projection exposure apparatus (1) has at least one optical component (19, 21, 23, 7, M1 to M6, 13) having an optical surface guiding used EUV radiation (16) from an EUV source (3) along an illuminating and/or imaging beam path of the projection exposure apparatus (1). The optical component (19, 21, 23, 7, M1 to M6, 13) is accommodated in a reduced-pressure chamber (36). A gas source (37) is fluidically connected via at least one valve to the reduced-pressure chamber (36). The gas source (37) is configured to provide at least the following gas: hydrogen. This results in an EUV optics module having elevated operating time.