EUV Pellicle Carbon Boron Composite Heat Dissipation

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Solution Overview

Problem

Pellicles used in extreme ultraviolet light exposure during photolithography processes are prone to damage from heat and hydrogen plasma, leading to thermal stress and reduced lifespan due to inadequate heat dissipation and chemical resistance.

Innovation Solution

A pellicle design featuring a carbon-based main layer with a boron-based enhancement layer and intermixing layers, which enhances heat dissipation and chemical resistance, attached to a frame for structural support, to extend the pellicle's lifespan in extreme ultraviolet light exposure environments.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If a carbon-based main layer is used in the pellicle, then heat dissipation is improved, but chemical resistance to hydrogen plasma deteriorates

Engineering Contradiction:

Improveheat dissipationVSAvoidchemical resistance

Core Design Contradiction:

TemperatureVSReliability

Solution Approach 1:

The pellicle employs a composite structure combining a carbon-based main layer with boron-based enhancement layers. The carbon layer provides heat dissipation properties while the boron-based layers contribute chemical resistance to hydrogen plasma, achieving both required properties through material composition

Inventive Principle:

Principle #40Composite materials

2Productivity

If the pellicle is exposed to extreme ultraviolet light for extended periods, then productivity is improved, but thermal stress and chemical deformation increase

Engineering Contradiction:

Improveexposure durationVSAvoidpellicle integrity

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The boron-based enhancement layers are applied in advance to protect the carbon-based main layer from hydrogen plasma exposure during extended photolithography processes. This preliminary protective measure prevents chemical deformation and thermal stress damage before they can occur during prolonged UV exposure

Inventive Principle:

Principle #11Beforehand cushioning (Prior cushioning)

Solution Approach 2:

The multi-layer composite structure with carbon-based main layer and boron-based enhancement layers works together to simultaneously provide heat dissipation and chemical resistance, enabling the pellicle to withstand extended exposure to extreme ultraviolet light without degradation

Inventive Principle:

Principle #40Composite materials

3Device complexity

If a simple single-layer pellicle structure is used, then device complexity is reduced, but adhesive strength and chemical resistance deteriorate

Engineering Contradiction:

Improvepellicle structureVSAvoidadhesive strength

Core Design Contradiction:

Device complexityVSReliability

Solution Approach 1:

The pellicle uses a composite structure with a carbon-based main layer and boron-based enhancement layers. This multi-material approach improves adhesive strength and chemical resistance compared to simple single-layer structures, while maintaining reasonable manufacturing complexity

Inventive Principle:

Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The pellicle design effectively reduces chemical deformation and extends the pellicle's lifespan by improving adhesive strength and heat dissipation, minimizing damage from hydrogen plasma and thermal stress, ensuring reliable performance in extended exposure to extreme ultraviolet light.

Implementation Method 1

a boron-based enhancement layer covering at least one of the first surface and the second surface... hydrogen plasma resistant chemical enhancement layer

Methodology Applied

Scientific EffectChemical resistance:

Implementation Method 2

carbon-based main layer having a first surface and a second surface opposite to the first surface... improves adhesive strength and heat dissipation

Methodology Applied

Scientific EffectHeat dissipation: Conduction (thermal)

Implementation Method 3

an intermixing layer exists across an interface between the carbon-based main layer and the chemical enhancement layer includes a component derived from the carbon-based main layer and a component derived from the chemical enhancement layer

Methodology Applied

Scientific EffectAdhesive strength: Chemical Bonding

Data Source

PatentUS10437143B2Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicle

Publication Date: 2019.10.08 SAMSUNG ELECTRONICS CO LTD

AI summary

Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.