EUV Mask Pellicle Assembly Conductive Mounts for ESD Protection
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Solution Overview
Problem
EUV pellicles used in semiconductor manufacturing are delicate and expensive, and they can be damaged by electrostatic discharge (ESD) due to charge imbalance between the pellicle and mask surfaces, leading to mechanical stress and potential rupture.
Innovation Solution
The implementation of conductive assembly mounts between the pellicle assembly and the EUV photomask to create a conductive path, reducing or eliminating charge differences and preventing electrostatic discharge. This is achieved through the use of conductive adhesives and materials with sufficient surface resistivity to ensure electrostatic dissipation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If non-conductive assembly mounts are used to attach the pellicle assembly, then the pellicle membrane can be isolated from the mask surface, but electrostatic charge imbalance accumulates between the pellicle and mask, causing ESD damage
Solution Approach 1:
The assembly mounts are designed with specific electrical conductivity parameters to balance isolation and charge dissipation. The mounts provide sufficient electrical conductivity to dissipate static charges while maintaining mechanical isolation between the pellicle membrane and mask surface, preventing ESD damage without compromising protective function.
Solution Approach 2:
The assembly mounts serve as an intermediary component between the pellicle assembly and mask. These mounts mediate the electrical interaction by providing controlled conductivity paths that allow charge dissipation while maintaining the physical separation needed for pellicle protection during scan operations.
2Reliability
If conductive assembly mounts are used to dissipate electrostatic charge, then ESD damage is prevented, but the electrical conductivity may cause charge discharge that could affect scan operations
Solution Approach 1:
The assembly mounts are designed with specific electrical conductivity parameters to balance isolation and charge dissipation. The mounts provide sufficient electrical conductivity to dissipate static charges while maintaining mechanical isolation between the pellicle membrane and mask surface, preventing ESD damage without compromising protective function.
Solution Approach 2:
The assembly mounts serve as an intermediary component between the pellicle assembly and mask. These mounts mediate the electrical interaction by providing controlled conductivity paths that allow charge dissipation while maintaining the physical separation needed for pellicle protection during scan operations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces the risk of ESD damage to both the pellicle and mask, enhancing their durability and longevity by maintaining a stable charge balance and reducing mechanical stress on the pellicle membrane.
Implementation Method 1
The assembly mounts facilitate sufficient electrical conductivity between the pellicle membrane and mask scan surface to at least be electro statically dissipative
Implementation Method 2
there is sufficient electrical conductivity between the pellicle membrane and mask scan surface to at least be electro statically dissipative between the mask and pellicle assembly
Data Source
Figure 1A~1B
Figure 2~4B
Figure 5~6
AI summary
Provided is a pellicle assembly that is sufficiently conductive in cooperation with a photomask that is mounted to the pellicle assembly to protect the pellicle and mask from electro static discharge.