EUV Pellicle Drying via Supernatant Layer
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Solution Overview
Problem
Conventional methods fail to effectively and consistently fabricate ultra-thin, large-area EUV pellicles due to the challenges of managing mechanical stability during drying, particularly the capillary force exerted on the pellicle membrane when withdrawing it from a rinse bath.
Innovation Solution
A method involving the formation of a supernatant polar organic layer with lower surface tension than the rinse bath solution, allowing the EUV pellicle to be withdrawn through this layer during drying, which reduces capillary forces and prevents membrane breakage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional drying methods are used to withdraw the pellicle from the rinse bath, then the pellicle can be dried, but the capillary force breaks the ultra-thin pellicle membrane
Solution Approach 1:
A supernatant polar organic layer is introduced as an intermediary between the rinse bath and the pellicle during withdrawal. This organic layer has lower surface tension than the rinse bath, creating a gentler capillary force that prevents breaking of the ultra-thin pellicle membrane while still enabling effective drying.
2Force
If the surface tension of the drying liquid is minimized, then capillary forces are reduced, but conventional methods require volumetric changes or specialty chemicals that cannot consistently fabricate ultra-thin, large-area EUV pellicles
Solution Approach 1:
The surface tension parameter of the drying liquid is changed by using a polar organic layer with lower surface tension than the rinse bath. This parameter change reduces capillary forces to a level that prevents pellicle breakage while maintaining manufacturing precision for ultra-thin, large-area EUV pellicles.
3Loss of time
If the pellicle is withdrawn quickly from the rinse bath, then drying time is reduced, but the capillary force still has time to break the fragile membrane
Solution Approach 1:
The supernatant polar organic layer serves as a protective intermediary during the withdrawal process. It allows the pellicle to be withdrawn at controlled speeds while the lower surface tension of the organic layer prevents capillary forces from breaking the fragile membrane, thus reducing drying time without compromising membrane strength.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the successful drying of EUV pellicles without damage, maintaining their mechanical stability and preventing residue deposition, thus facilitating the production of high-quality EUV pellicles for semiconductor fabrication.
Implementation Method 1
A top layer is formed above the rinse bath solution, the top layer having a lower surface tension than the rinse bath
Implementation Method 2
Such capillary force is operative at the liquid-gas-solid boundary on both sides of the partially immersed membrane, and may result in a downward pulling force
Data Source
AI summary
Systems and methods for rinsing one or more pellicles during fabrication, including immersing and soaking the one or more pellicles in a rinse bath solution for a particular time period, forming a top layer above the rinse bath solution, the top layer having a lower surface tension than the rinse bath, and withdrawing the one or more pellicles through the top layer for drying.