EUV Pellicle Handling Block and Mesh Support
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Solution Overview
Problem
The existing pellicle films used in EUV lithography processes are challenging to handle due to their thin thickness, which restricts their usage and can lead to damage during handling and processing.
Innovation Solution
A pellicle design incorporating a handling block with an opening on one surface and a supporting structure with a mesh pattern on the other, along with etch stop layers, to facilitate easier handling and support the thin pellicle film, allowing for a thickness of 30 nm to 100 nm while maintaining EUV transmissivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Use of energy by moving object
If the pellicle film thickness is reduced to allow EUV penetration, then EUV transmissivity is improved, but handling difficulty increases and damage risk increases
Solution Approach 1:
The pellicle structure is segmented into multiple functional components: a thin pellicle film for EUV transmission, a supporting structure with mesh pattern for mechanical strength, and a handling block for easy manipulation. This segmentation allows each component to optimize its specific function while working together as a complete system.
Solution Approach 2:
The handling block acts as an intermediary between the operator and the fragile thin pellicle film. By providing a robust gripping interface, it mediates the interaction between human handling and the delicate film, preventing direct contact and potential damage to the thin film portion.
2Use of energy by moving object
If the pellicle film thickness is reduced to allow EUV penetration, then EUV transmissivity is improved, but structural strength deteriorates
Solution Approach 1:
The pellicle structure is segmented into multiple functional components: a thin pellicle film for EUV transmission, a supporting structure with mesh pattern for mechanical strength, and a handling block for easy manipulation. This segmentation allows each component to optimize its specific function while working together as a complete system.
Solution Approach 2:
The pellicle assembly combines different materials with complementary properties: the pellicle film material optimized for EUV transparency, the supporting structure material providing mechanical strength and stability, and the handling block material offering robustness for manipulation. This composite structure achieves both EUV transmissivity and structural strength.
3Strength
If a supporting structure is added to strengthen the pellicle film, then structural strength is improved, but device complexity increases
Solution Approach 1:
The supporting structure is designed with local quality variations: a mesh pattern provides distributed support across the pellicle film surface, while the handling block concentrates support and handling capability at specific locations. This localized approach provides strength where needed without uniformly increasing complexity throughout the entire structure.
Solution Approach 2:
The supporting structure serves multiple functions simultaneously: it provides mechanical strength to the thin pellicle film, defines the optical aperture through its mesh pattern, and integrates with the handling block for easy manipulation. This multi-functionality reduces the need for separate components, thereby managing complexity.
4Use of energy by moving object
If the pellicle film thickness is reduced, then EUV transmissivity is improved, but reliability during handling deteriorates
Solution Approach 1:
The pellicle structure is segmented into multiple functional components: a thin pellicle film for EUV transmission, a supporting structure with mesh pattern for mechanical strength, and a handling block for easy manipulation. This segmentation allows each component to optimize its specific function while working together as a complete system.
Solution Approach 2:
The supporting structure and handling block are designed to protect the thin pellicle film before handling operations begin. The mesh pattern provides distributed support across the film surface, preventing localized stress concentrations that could cause damage during subsequent manipulation and processing steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design enables easier handling and processing of the pellicle film, reducing the risk of damage and ensuring effective EUV transmission, thereby enhancing the usability of the pellicle in EUV lithography processes.
Implementation Method 1
The pellicle film may allow the EUV, which may pass through the mask, to penetrate the pellicle film
Data Source
AI summary
A pellicle for an EUV lithography may include a pellicle film, a supporting structure and a handling block. The pellicle film may have a first surface for orienting opposite to a mask, and a second surface opposite to the first surface and for orienting toward the mask. The pellicle film may allow the EUV, which may pass through the mask, to penetrate the pellicle film. The supporting structure may be arranged on the second surface of the pellicle film to support the pellicle film. The handling block may be arranged on the first surface of the pellicle film. The handling block may have an opening configured to expose the pellicle film. Thus, the pellicle may be handled using the thick handling block, not the thin pellicle film, so that the thin pellicle film may not be damaged. The pellicle may protect the mask from byproducts generated in the EUV lithography process so that the mask may not be contaminated.