EUV Pellicle Magnet Stack Beam Isolation
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Solution Overview
Problem
The mechanical stability of ultra-thin EUV pellicles is challenging during fabrication due to external forces like mechanical vibrations, liquid and air pressure differentials, and capillary forces, which can lead to breakage and contamination.
Innovation Solution
A membrane holder system using a glass wafer with magnet stack beams of uniform dimensions to connect and suspend the EUV pellicle, creating a gap between the pellicle and the substrate holder, preventing direct contact and minimizing mechanical vibrations, and employing baffle wafers to prevent contamination from broken pellicles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If the pellicle is made very thin (e.g., 100 nm or less) to achieve desired optical properties, then the optical performance is improved, but the mechanical stability deteriorates making the pellicle susceptible to breakage under external forces
Solution Approach 1:
The support structure is segmented into multiple magnet stack beams distributed across the substrate wafer, with each beam providing localized support to the pellicle. This segmentation allows the thin pellicle to maintain mechanical stability through distributed support points while preserving its optical properties.
Solution Approach 2:
Magnet stack beams are introduced as intermediary elements between the substrate wafer and the pellicle. These magnets provide mechanical support and create a controlled gap, acting as a mediator that protects the thin pellicle from direct contact with the substrate while maintaining structural integrity during fabrication processes.
2Strength
If the pellicle is held close to the substrate wafer for support, then the mechanical support is improved, but the exposure to capillary forces and mechanical vibrations from the substrate holder increases
Solution Approach 1:
The magnet stack beams serve as intermediaries that provide mechanical support through magnetic attraction while maintaining a controlled gap between the pellicle and substrate holder. This gap reduces exposure to capillary forces during rinsing while the distributed magnet arrangement minimizes mechanical vibration transmission.
Solution Approach 2:
The magnet stack beams perform multiple functions: providing mechanical support, creating a protective gap, and serving as a universal mounting mechanism that can be applied across different substrate holder configurations. This multi-functionality addresses both support and harm reduction requirements.
3Stability of the object's composition
If the substrate holder directly contacts the pellicle for stable positioning, then the positioning stability is improved, but the risk of contamination and mechanical damage increases
Solution Approach 1:
Magnet stack beams are positioned on the substrate wafer to act as intermediaries that provide stable positioning through magnetic attraction while maintaining a gap between the pellicle and substrate holder. This prevents direct contact and associated contamination risks while preserving positioning stability during fabrication processes.
4Ease of manufacture
If conventional direct contact mounting is used to simplify the fabrication process, then the ease of manufacture is improved, but the pellicle is exposed to harmful forces and contamination
Solution Approach 1:
The magnet stack beams utilize magnetic attraction to automatically secure the pellicle to the substrate wafer without requiring direct contact or complex mounting mechanisms. This self-service approach simplifies the fabrication process while the magnetic gap prevents exposure to harmful forces and contamination.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively isolates the EUV pellicle from mechanical perturbations and contamination, ensuring the integrity of the pellicle during wet etching and rinsing processes, enhancing the reliability of EUV lithography.
Implementation Method 1
A plurality of magnets of uniform dimensions are formed into two or more magnet stack beams for connecting a membrane to the wafer
Implementation Method 2
capillary forces (e.g., due to meniscus formation at the liquid-air interface)
Data Source
AI summary
Systems and methods for isolating a membrane during fabrication. The membrane is connected to a substrate wafer using a plurality of magnets of uniform dimensions formed into two or more magnet stack beams. The magnet stack beams provide a gap between the wafer and the membrane. The wafer connected to the membrane by the magnet stack beams is received by a substrate holder so that a space is present between the membrane and the substrate holder. The membrane is rinsed by immersing, soaking, and withdrawing the substrate holder and the wafer connected to the membrane by the magnet stack beams using a rinse bath solution.