EUV Pellicle Membrane Manufacturing via Preliminary Border Etching
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Solution Overview
Problem
The manufacturing of pellicle membranes for EUV lithography is challenging due to their thinness, which makes them susceptible to damage and defects, leading to reduced performance, lifespan, and increased production time, with existing methods requiring complex and time-consuming processes that often result in over-etching and delayed identification of defects.
Innovation Solution
A method where the pellicle membrane layer is deposited after etching steps have defined the pellicle border, allowing for reduced risk of damage during processing and enabling the pellicle assembly to be formed with a pellicle membrane layer that is mechanically or chemically attached to a pellicle frame, with additional layers such as emissive and capping layers to enhance strength and EUV transmissivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the pellicle membrane layer is deposited early in the manufacturing process, then the manufacturing process can proceed systematically, but the membrane is susceptible to damage and defects during subsequent processing steps
Solution Approach 1:
The etching steps that define the pellicle border are performed in advance before the pellicle membrane layer is deposited. This preliminary action creates the structural framework first, so that when the membrane is subsequently deposited, there are no subsequent etching or processing steps that could damage it.
2Manufacturing precision
If complex manufacturing processes are used to ensure membrane quality, then manufacturing precision can be improved, but production time increases
Solution Approach 1:
By performing the etching steps to define the pellicle border before depositing the membrane layer, the process eliminates the need for subsequent handling and processing of the fragile membrane. This reduces the total number of process steps and minimizes opportunities for defects, thereby shortening production time while maintaining or improving membrane quality.
3Use of energy by moving object
If the pellicle membrane is made thinner to improve EUV transmissivity, then optical performance is improved, but the membrane becomes more susceptible to damage
Solution Approach 1:
The pellicle border structure is formed by etching before the membrane layer is deposited. This creates a robust supporting framework in advance that can provide mechanical strength to the subsequently deposited thin membrane layer, enabling the use of thinner membranes for improved EUV transmissivity without sacrificing structural integrity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the likelihood of damage during manufacturing, shortens the production cycle, and allows for the use of a wider range of materials and layer thicknesses, resulting in pellicle assemblies with improved yield, strength, and reduced operating temperature.
Implementation Method 1
a layer which forms at least part of a pellicle membrane is provided after one or more etching steps which define a pellicle border holding the pellicle membrane
Implementation Method 2
one or more etching steps which define a pellicle border holding the pellicle membrane
Data Source
AI summary
A method of manufacturing a membrane assembly for EUV lithography, wherein a layer which forms at least part of a pellicle membrane is provided after one or more etching steps which define a pellicle border holding the pellicle membrane. Also provided is a pellicle substrate, the substrate including: a stack having a front face and back face, wherein one or more layers on the back face of the stack have been selectively removed to define a pellicle border region for holding the pellicle membrane before the layer which forms at least part of a pellicle membrane has been provided.