EUV Pellicle Microstructure Mounting for Fast Residue-Free Demounting
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Solution Overview
Problem
The challenge in EUV lithography is protecting the EUV photo mask from damage, dust, and moisture while maintaining high transparency and durability, especially during the mounting and demounting processes of the pellicle, which can be difficult and time-consuming, and may cause residue or damage to the mask.
Innovation Solution
The use of microstructures, such as fibers or cones made of materials like PDMS or magnetic elastomers, with controlled adhesion and deformation properties, allows for efficient mounting and demounting of the pellicle on the EUV photo mask without residue, using controlled pressure or heat to ensure stable attachment and detachment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a pellicle is mounted on an EUV photo mask to protect it from damage, dust, and moisture, then the protection and durability are improved, but the mounting and demounting processes become difficult and time-consuming
Solution Approach 1:
The mounting structure is divided into multiple microstructures (such as micro-pillars or micro-springs) distributed across the pellicle frame. Each microstructure independently provides adhesion to the mask substrate, allowing the pellicle to be securely mounted while enabling easy demounting by simply lifting the pellicle, thus reducing operation time without compromising protection
Solution Approach 2:
The microstructures are designed with elastic or flexible properties, allowing them to dynamically adapt during mounting and demounting processes. The microstructures can deform during attachment and return to their original shape during detachment, enabling quick and residue-free mounting while maintaining stable protection during EUV lithography operations
2Stability of the object's composition
If conventional mounting methods are used to attach the pellicle to the EUV photo mask, then the attachment stability is improved, but residue and damage occur to the mask during demounting
Solution Approach 1:
The microstructures are designed as sacrificial or easily replaceable elements that can be quickly attached and detached without leaving residue. These microstructures serve their protective function during EUV lithography and can be rapidly removed or replaced without damaging the expensive EUV photo mask, thus eliminating the harmful effect of residue and damage
Solution Approach 2:
The microstructures act as an intermediary layer between the pellicle frame and the EUV photo mask substrate. This intermediary layer provides the necessary adhesion for stable attachment while allowing clean detachment without direct contact between the pellicle mounting mechanism and the mask surface, thereby preventing residue and damage to the mask
3Reliability
If the pellicle is securely attached to the EUV photo mask, then the protection during EUV lithography is improved, but the mounting and demounting complexity increases
Solution Approach 1:
The microstructures are designed to automatically provide both secure attachment and easy detachment functionality. The elastic or flexible microstructures self-adjust during mounting and automatically release during demounting without requiring complex mechanical mechanisms or additional tools, thus maintaining simple operation while ensuring reliable protection during EUV lithography
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method facilitates quick and residue-free mounting and demounting of the pellicle, preserving the EUV photo mask's integrity and reducing operation time, while maintaining high transparency and durability during EUV lithography processes.
Implementation Method 1
a plurality of micro structures made of an adhesive elastomer and disposed on a bottom of the frame
Implementation Method 2
The plurality of micro structures are detached from the photo mask by applying a force or energy to the plurality of micro structures
Data Source
AI summary
In a method of de-mounting a pellicle from a photo mask, the photo mask with the pellicle is placed on a pellicle holder. The pellicle is attached to the photo mask by a plurality of micro structures. The plurality of micro structures are detached from the photo mask by applying a force or energy to the plurality of micro structures before or without applying a pulling force to separate the pellicle from the photo mask. The pellicle is de-mounted from the photo mask. In one or more of the foregoing and following embodiments, the plurality of micro structures are made of an elastomer.