EUV Pellicle with Vent Frame and Carbon Membrane

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Solution Overview

Problem

Conventional pellicles in EUV lithography systems are prone to mechanical deformation under high temperature and pressure conditions, leading to reduced EUV radiation transmission and frequent replacements, while also allowing particles to contaminate the photomask.

Innovation Solution

A robust, high transmission pellicle with a carbon-based or silicon-based membrane coated with a protective shell, supported by a frame with a vent structure to minimize pressure differential and enhance environmental stability, allowing for greater than 82% EUV radiation transmission while preventing particle contamination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a conventional pellicle is used in EUV lithography, then it can protect the photomask from particle contamination, but it undergoes mechanical deformation under high temperature and pressure conditions, leading to reduced EUV radiation transmission

Engineering Contradiction:

Improveparticle contamination protectionVSAvoidEUV radiation transmission

Core Design Contradiction:

ReliabilityVSIllumination intensity

Solution Approach 1:

The pellicle membrane is constructed from carbon-based or silicon-based materials with specific structural parameters (nanotube networks, nanowire assemblies, or porous structures) that fundamentally change the material properties to achieve both high EUV transmission (>82%) and mechanical robustness under temperature and pressure variations

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The pellicle employs composite structures combining carbon-based materials (graphene, carbon nanotubes) or silicon-based materials (silicon nanowires, porous silicon) with protective coatings, creating a multi-layer composite that simultaneously provides high radiation transmission, mechanical strength, and environmental stability

Inventive Principle:

Principle #40Composite materials

2Strength

If a thicker pellicle membrane is used to improve mechanical robustness, then it can better resist deformation under temperature and pressure, but it reduces the transmission of EUV radiation

Engineering Contradiction:

Improvemechanical robustnessVSAvoidEUV radiation transmission

Core Design Contradiction:

StrengthVSIllumination intensity

Solution Approach 1:

The pellicle utilizes ultra-thin membrane structures (nanotube films, nanowire networks, porous membranes) that are thin enough to transmit >82% of EUV radiation while maintaining mechanical integrity through their unique nanostructured architecture and supporting frame with vent structures

Inventive Principle:

Principle #30Flexible shells and thin films

Solution Approach 2:

Different regions of the pellicle structure have optimized properties: the membrane material provides high EUV transmission, the nanostructured network provides mechanical strength, and the vent structures in the frame provide pressure equalization, with each component having locally optimized quality for its specific function

Inventive Principle:

Principle #3Local quality

3Ease of manufacture

If a conventional pellicle material is used, then it can be easily manufactured, but it is prone to mechanical deformation under high temperature conditions, requiring frequent replacements

Engineering Contradiction:

Improvemanufacturing simplicityVSAvoidresistance to temperature-induced deformation

Core Design Contradiction:

Ease of manufactureVSReliability

Solution Approach 1:

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The invention replaces expensive, frequently replaced conventional pellicles with a more durable carbon-based or silicon-based membrane that has extended service life under EUV lithography conditions, reducing replacement frequency and operational costs

Inventive Principle:

Principle #27Cheap short-living objects (Disposable)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The pellicle maintains mechanical robustness and high radiation transmission, reducing contamination and the need for frequent replacements, thereby improving the efficiency and reliability of EUV lithography systems.

Implementation Method 1

allowing for greater than 82% EUV radiation transmission

Methodology Applied

Scientific EffectRadiation transmission: Absorption (EM radiation)

Implementation Method 2

coated with a protective shell that dissipates heat from the film

Methodology Applied

Scientific EffectPhysical barrier protection: Physical Containment

Implementation Method 3

a frame supporting the film, wherein the frame includes at least one aperture to allow for a flow of air through a portion of the pellicle

Methodology Applied

Scientific EffectPressure equalization: Pressure Gradient

Implementation Method 4

coated with a protective shell that dissipates heat from the film

Methodology Applied

Scientific EffectHeat dissipation: Conduction (thermal)

Data Source

PatentUS12055855B2Extreme ultraviolet lithography method using robust, high transmission pellicle

Publication Date: 2024.08.06 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD

AI summary

A robust, high-transmission pellicle for extreme ultraviolet lithography systems is disclosed. In one example, the present disclosure provides a pellicle that includes a membrane and a frame supporting the membrane. The membrane may be formed from at least one of a transparent carbon-based film and a transparent silicon based film. The at least one of the transparent carbon-based film and the transparent silicon based film may further be coated with a protective shell. The frame may include at least one aperture to allow for a flow of air through a portion of the pellicle.