EUV Radiation Generation Apparatus with Radiation Guide
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Solution Overview
Problem
In EUV radiation generation systems, unwanted amplification of radiation occurs in the optical gain medium when the target material is not present, leading to inefficient pumping and reduced laser beam intensity.
Innovation Solution
An EUV radiation generation apparatus with a radiation guide structure having an outer surface that directs laser radiation away from the optical gain medium, preventing unwanted amplification and ensuring consistent interaction with the target material.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If the optical gain medium is exposed to laser radiation without target material present, then radiation amplification occurs in the gain medium, but this leads to unwanted radiation entering the beam path and reducing laser beam intensity
Solution Approach 1:
The harmful unwanted radiation is extracted and removed from the beam path by the radiation guide structure, which directs it away from the optical gain medium and prevents it from re-entering the beam path, thereby preserving laser beam intensity
Solution Approach 2:
The radiation guide acts as an intermediary element between the optical gain medium and the beam path, intercepting unwanted radiation and redirecting it to a safe location where it cannot interfere with the laser beam
2Power
If the radiation guide structure is added to direct radiation away from the gain medium, then laser beam intensity is maintained, but device complexity increases
Solution Approach 1:
The radiation guide structure serves multiple functions: it directs unwanted radiation away from the gain medium, prevents radiation from re-entering the beam path, and maintains laser beam intensity, thereby justifying its addition through multi-functionality
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution reduces unwanted radiation entering the beam path, maintaining the intensity of the laser beam and ensuring consistent EUV plasma production, thereby enhancing the efficiency of the EUV radiation generation process.
Implementation Method 1
a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium
Implementation Method 2
an optical gain medium positioned along the beam path and configured to produce laser radiation for interaction with the target material
Implementation Method 3
laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma
Data Source
AI summary
An EUV radiation generation apparatus includes an optical gain medium configured to produce laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma, and a structure defining an aperture through which the laser radiation may pass. The structure includes a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium.


