EUV Radiation Generation Apparatus with Radiation Guide

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Solution Overview

Problem

In EUV radiation generation systems, unwanted amplification of radiation occurs in the optical gain medium when the target material is not present, leading to inefficient pumping and reduced laser beam intensity.

Innovation Solution

An EUV radiation generation apparatus with a radiation guide structure having an outer surface that directs laser radiation away from the optical gain medium, preventing unwanted amplification and ensuring consistent interaction with the target material.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Power

If the optical gain medium is exposed to laser radiation without target material present, then radiation amplification occurs in the gain medium, but this leads to unwanted radiation entering the beam path and reducing laser beam intensity

Engineering Contradiction:
Improvelaser beam intensityVSAvoidenergy loss from unwanted amplification
Core Design Contradiction:
PowerVSLoss of energy

Solution Approach 1:

The harmful unwanted radiation is extracted and removed from the beam path by the radiation guide structure, which directs it away from the optical gain medium and prevents it from re-entering the beam path, thereby preserving laser beam intensity

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The radiation guide acts as an intermediary element between the optical gain medium and the beam path, intercepting unwanted radiation and redirecting it to a safe location where it cannot interfere with the laser beam

Inventive Principle:
Principle #24Intermediary (Mediator)

2Power

If the radiation guide structure is added to direct radiation away from the gain medium, then laser beam intensity is maintained, but device complexity increases

Engineering Contradiction:
Improvelaser beam intensityVSAvoidstructural complexity
Core Design Contradiction:
PowerVSDevice complexity

Solution Approach 1:

The radiation guide structure serves multiple functions: it directs unwanted radiation away from the gain medium, prevents radiation from re-entering the beam path, and maintains laser beam intensity, thereby justifying its addition through multi-functionality

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution reduces unwanted radiation entering the beam path, maintaining the intensity of the laser beam and ensuring consistent EUV plasma production, thereby enhancing the efficiency of the EUV radiation generation process.

Implementation Method 1

a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 2

an optical gain medium positioned along the beam path and configured to produce laser radiation for interaction with the target material

Methodology Applied
Scientific EffectStimulated emission: Laser

Implementation Method 3

laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma

Methodology Applied
Scientific EffectLaser-produced plasma: Plasma

Data Source

PatentUS8547525B2EUV radiation generation apparatus
Publication Date: 2013.10.01 ASML NETHERLANDS BV
  • US8547525B2 patent drawing
  • US8547525B2 patent drawing
  • US8547525B2 patent drawing

AI summary

An EUV radiation generation apparatus includes an optical gain medium configured to produce laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma, and a structure defining an aperture through which the laser radiation may pass. The structure includes a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium.