EUV Resist Resin Composition for Line Edge Roughness and Collapse Control
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Solution Overview
Problem
Current actinic ray-sensitive or radiation-sensitive resin compositions face challenges in forming patterns with excellent line edge roughness (LER) and collapse suppressing ability, particularly when used in lithography with extreme ultraviolet (EUV) light, where sensitivity and pattern integrity are compromised due to photon shot noise and aspect ratio considerations.
Innovation Solution
Incorporating a resin with a specific structure that increases polarity through acid action, including a repeating unit represented by General Formula (B-1) in the actinic ray-sensitive or radiation-sensitive resin composition, along with fluorine or iodine atoms, to enhance EUV light absorption and pattern formation quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a resin whose polarity increases by acid action is used in the resin composition, then the sensitivity and LER of the formed pattern are improved, but the collapse suppressing ability deteriorates
Solution Approach 1:
The patent applies parameter changes by precisely controlling the content of the repeating unit having increased polarity (Formula B-1) within 5-70 mass%, and the repeating unit with lactone structure (Formula A-II) within 30-80 mass%. This optimization of compositional parameters resolves the contradiction by finding the optimal balance point where both LER and collapse suppression are satisfied simultaneously.
Solution Approach 2:
The patent uses composite materials by combining multiple resin components with different functions: the polar repeating unit (Formula B-1) for LER improvement, the lactone-containing repeating unit (Formula A-II) for collapse suppression, and fluorinated/iodinated units for EUV absorption enhancement. The synergistic combination of these composite resin units resolves the technical contradiction.
2Manufacturing precision
If the content of the repeating unit with increased polarity is increased to improve LER, then the sensitivity improves, but the aspect ratio of the pattern decreases leading to poor collapse suppression
Solution Approach 1:
The patent optimizes the compositional parameters by limiting the repeating unit (Formula B-1) to 5-70 mass% and (Formula A-II) to 30-80 mass%, preventing excessive polarity increase that would harm aspect ratio while still improving LER through controlled parameter adjustment.
Solution Approach 2:
The patent combines resin units with different structural characteristics: Formula B-1 units for polarity control and LER improvement, Formula A-II units for maintaining mechanical strength and aspect ratio, and fluorinated/iodinated units for sensitivity enhancement. This composite approach allows simultaneous optimization of LER and aspect ratio.
3Productivity
If fluorine or iodine atoms are incorporated to enhance EUV light absorption, then the sensitivity improves, but the complexity of the resin structure increases
Solution Approach 1:
The patent applies local quality by incorporating fluorine or iodine atoms specifically in certain repeating units rather than throughout the entire resin structure. This localized incorporation enhances EUV absorption where needed while maintaining simpler structures in other regions, thus improving sensitivity without excessive complexity increase.
Solution Approach 2:
The patent optimizes the complexity-sensitivity tradeoff by controlling the content of fluorinated/iodinated repeating units within specific ranges, adjusting the compositional parameters to achieve adequate EUV absorption while limiting structural complexity to manageable levels.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution results in a resist film with improved sensitivity and excellent LER and collapse suppressing ability, suitable for EUV lithography, by optimizing the content of the repeating unit and incorporating halogen atoms to reduce photon shot noise and maintain pattern integrity.
Implementation Method 1
a compound that generates an acid upon irradiation with actinic rays or radiation
Implementation Method 2
a resin whose polarity increases by the action of an acid
Implementation Method 3
incorporating halogen atoms to reduce photon shot noise and maintain pattern integrity
Data Source
AI summary
An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern thus formed has excellent LER and collapse suppressing ability. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, and a resin whose polarity increases by the action of an acid, in which the resin includes a repeating unit represented by General Formula (B-1), and a content of the repeating unit represented by General Formula (B-1) is 5% to 70% by mass with respect to all the repeating units in the resin. In General Formula (B-1), Ri represents a hydrogen atom or an organic group, the Ring W1 represents a ring which includes at least one carbon atom and one nitrogen atom, and may have a substituent