EUV Resist Composition for 20 nm Pattern Resolution
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Solution Overview
Problem
Current actinic ray-sensitive or radiation-sensitive resin compositions struggle to achieve high resolution for extremely fine patterns, such as line-and-space patterns with line widths or space widths of 20 nm or less, due to limitations in pattern formation using EUV light or electron beams.
Innovation Solution
An actinic ray-sensitive or radiation-sensitive resin composition comprising a resin decomposed by acid to increase polarity, combined with an ionic compound that generates acid upon irradiation and another that reduces acid-trapping properties, featuring a repeating unit represented by Formula (1) and containing specific ionic compounds to enhance pattern resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used for EUV lithography, then existing pattern formation is achieved, but resolution for extremely fine patterns (20 nm or less) is insufficient
Solution Approach 1:
The patent changes the chemical parameters of the resist composition by introducing a specific resin with repeating units containing carboxyl groups and acid-labile groups, along with ionic compounds, to achieve both high resolution and reliable pattern formation for 20 nm or less fine patterns
Solution Approach 2:
The patent creates a composite resist composition by combining multiple components: a resin with specific repeating units (Formula 1), ionic compounds (Formulas 2-5), and other auxiliary components, where each component contributes specific properties to achieve the desired resolution and reliability
2Manufacturing precision
If resin decomposed by acid to increase polarity is used, then pattern resolution is improved, but pattern collapse and defects occur
Solution Approach 1:
The patent applies local quality by having the resin decompose locally in exposed regions to increase polarity and improve resolution, while the ionic compounds provide localized acid-trapping to prevent excessive decomposition and maintain structural integrity in unexposed regions
Solution Approach 2:
The ionic compounds act as intermediaries that moderate the acid-catalyzed decomposition reaction, controlling the rate and extent of polarity increase to prevent pattern collapse while still achieving high resolution
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves excellent resolution for extremely fine patterns by precise reaction control and high rigidity of the resist film, suppressing pattern defects like collapse and enabling the formation of patterns with line widths or space widths of 20 nm or less.
Implementation Method 1
an ionic compound which generates an acid by irradiation with an actinic ray or a radiation
Implementation Method 2
an ionic compound which is decomposed by irradiation with an actinic ray or a radiation to reduce acid-trapping property
Data Source
AI summary
An actinic ray-sensitive or radiation-sensitive resin composition containing, (A) a resin which is decomposed by action of acid to increase polarity; and an ionic compound, in which the ionic compound contains (B) an ionic compound which generates an acid by irradiation with an actinic ray or a radiation and (C) an ionic compound which is decomposed by irradiation with an actinic ray or a radiation to reduce acid-trapping property, or contains (D) an ionic compound which generates an acid by irradiation with an actinic ray or a radiation and is decomposed by irradiation with an actinic ray or a radiation to reduce acid-trapping property, and the resin (A) has a repeating unit represented by the Formula (1).