EUV Resist Composition with Fluorinated Acid Generator
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Solution Overview
Problem
Current resist compositions containing onium salt-based acid generators face challenges in achieving high sensitivity and desired resist pattern shapes, especially when exposed to extreme ultraviolet (EUV) light, leading to difficulties in forming fine resist patterns with reduced roughness.
Innovation Solution
A new resist composition is developed, which includes a base material component and an acid generator component represented by the formula Rb1—Yb1—Vb1—CF2—SO3−(Mm+), where Rb1 is an aromatic hydrocarbon group, Yb1 contains an ester bond, and Vb1 is an alkylene or fluorinated alkylene group, enabling high sensitivity and precise pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If onium salt-based acid generators are used in resist composition, then the resist can form patterns with existing lithography techniques, but the sensitivity and pattern shape quality deteriorate when exposed to EUV light
Solution Approach 1:
The patent changes the chemical parameters of the acid generator by replacing onium salt-based compounds with carboxylic acid compounds having specific molecular structures (formula 1). This parameter change enables high sensitivity to EUV light while maintaining excellent resist pattern shape quality and reduced roughness, resolving the contradiction between reliability and manufacturing precision.
2Manufacturing precision
If conventional acid generators are used, then the resist composition maintains stability, but the sensitivity to EUV exposure and pattern formation quality deteriorate
Solution Approach 1:
The patent employs a composite acid generator structure consisting of a carboxylic acid group combined with specific hydrocarbon chains and aromatic rings (formula 1). This composite molecular structure provides both high EUV sensitivity and excellent pattern formation precision, overcoming the limitations of conventional single-function acid generators.
3Use of energy by moving object
If the resist composition is designed for high sensitivity, then the response to exposure light improves, but the resist pattern roughness increases
Solution Approach 1:
The patent introduces local quality variations in the acid generator molecule by combining a carboxylic acid group with specific hydrocarbon chains and aromatic rings in defined positions (formula 1). This local structural optimization enables high sensitivity while maintaining smooth pattern edges and reduced roughness, resolving the contradiction between sensitivity and shape quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The new resist composition achieves high sensitivity and forms resist patterns with excellent shape and reduced roughness, effectively addressing the limitations of existing compositions when exposed to EUV light.
Implementation Method 1
an acid generator component (B) which generates an acid upon exposure
Implementation Method 2
a base material component (A) whose solubility in the developing solution changes under the action of an acid
Data Source
AI summary
A resist composition which generates an acid upon exposure and changes a solubility in a developing solution under an action of the acid, the resist composition containing a base material component whose solubility in the developing solution changes under the action of an acid and an acid generator represented by general formula (b1). In general formula (b-1), Rb1 represents an aromatic hydrocarbon group having at least one alkyl group having 3 or more carbon atoms as a substituent, Yb1 represents a divalent linking group containing an ester bond (—C(═O)—O— or —O—C(═O)—), Vb1 represents an alkylene group, a fluorinated alkylene group, or a single bond, m is an integer of 1 or more, and Mm+ represents an m-valent organic cation.Rb1—Yb1—Vb1—CF2—SO3−(Mm+)1/m (b1)