EUV Reticle Cleaning via Alternating Polarity Electrostatic Field
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Solution Overview
Problem
Extreme ultraviolet (EUV) photolithography processes are disrupted by debris particles on the reticle, leading to functional failures in integrated circuits and requiring expensive and time-consuming cleaning processes.
Innovation Solution
A reticle cleaning system using a cleaning electrode with alternating voltage polarity to attract and capture charged debris particles, employing a film to ensure thorough removal without re-deposition, thereby maintaining the integrity of EUV photolithography.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional cleaning processes are used to remove debris from the reticle, then debris removal is achieved, but the process is expensive and time-consuming
Solution Approach 1:
The patent replaces mechanical cleaning methods with an electrostatic field-based cleaning system. A cleaning electrode generates an electrostatic field that attracts charged debris particles from the reticle surface, eliminating the need for complex mechanical cleaning processes and significantly reducing cleaning time while maintaining effectiveness
Solution Approach 2:
The patent changes the electrical parameter (voltage polarity) of the cleaning electrode dynamically. By switching between positive and negative voltage polarities, the system can attract both positively and negatively charged debris particles, ensuring comprehensive debris removal without requiring multiple cleaning passes
2Reliability
If traditional cleaning processes are used to remove debris from the reticle, then debris removal is achieved, but cleaning costs are high
Solution Approach 1:
The patent replaces expensive mechanical cleaning equipment and processes with a simple electrostatic field generation system using a voltage source and cleaning electrode. This substitution dramatically reduces cleaning costs while maintaining effective debris removal capability
Solution Approach 2:
The patent employs a disposable adhesive film on the cleaning electrode that captures debris particles. The film can be easily replaced without replacing the entire cleaning system, reducing overall cleaning costs by separating the expensive reusable components (electrode, voltage source) from the cheap disposable component (adhesive film)
3Productivity
If debris particles remain on the reticle, then photolithography processes can proceed, but process disruptions and functional failures occur
Solution Approach 1:
The patent performs debris removal as a preliminary action before the photolithography process continues. By cleaning the reticle surface in advance using the electrostatic field, the system prevents potential process disruptions and functional failures that would occur if debris remained on the reticle during processing
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system efficiently and effectively removes debris from the reticle, preventing process disruptions, reducing the need for expensive reticle replacements, and improving wafer yields while minimizing cleaning time and costs.
Implementation Method 1
cleaning an exposure face of the reticle by generating an electrostatic field with a cleaning electrode
Implementation Method 2
attract and capture charged debris particles
Data Source
AI summary
An extreme ultraviolet (EUV) photolithography system cleans debris from an EUV reticle. The system includes a cleaning electrode configured to be positioned adjacent the EUV reticle. The system includes a voltage source that helps draw debris from the EUV reticle toward the cleaning electrode by applying a voltage of alternating polarity to the cleaning electrode.