EUV Reticle Cleaning Device with Stress Sensor Feedback
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Solution Overview
Problem
Existing reticle cleaning technologies for EUV lithography risk damaging the reticle due to applied pressure, which can lead to distortion of the light shape projected onto semiconductor devices, resulting in imprecision and potential failure of the devices.
Innovation Solution
A reticle cleaning device equipped with a support member and a contact surface with a stress sensor, which measures the applied stress and ceases movement when a threshold is reached, preventing excessive pressure on the reticle.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If pressure is applied to remove particles from the reticle, then cleaning effectiveness is improved, but the reticle may be damaged or distorted
Solution Approach 1:
The patent implements a feedback mechanism where a sensor detects the actual pressure applied to the reticle during cleaning, and this information is fed back to a controller that adjusts the cleaning force in real-time to maintain pressure within a safe range, thus preventing reticle damage while ensuring effective particle removal
Solution Approach 2:
The patent changes the parameter of cleaning pressure from a fixed high value to a dynamically controlled variable that stays within a predetermined safe range, transforming the cleaning process from a high-risk operation to a controlled process that prevents reticle damage while maintaining cleaning effectiveness
2Reliability
If a contact-based cleaning tool is used to remove particles, then particle removal capability is improved, but the risk of applying excessive stress increases
Solution Approach 1:
The patent uses a sensor to continuously monitor the stress applied by the contact-based cleaning tool and provides feedback to a controller that adjusts the cleaning force, ensuring that particle removal capability is maintained while preventing excessive stress that could damage the reticle
Solution Approach 2:
The patent replaces purely mechanical contact-based cleaning with a controlled system that uses sensor feedback to regulate the mechanical force, substituting uncontrolled mechanical action with a regulated process that monitors and limits applied stress
3Reliability
If cleaning pressure is increased to ensure particle removal, then cleaning reliability is improved, but light distortion and device imprecision worsen
Solution Approach 1:
The patent changes the cleaning pressure parameter from high and variable to controlled and limited within a safe range, preventing the light distortion and manufacturing precision issues that arise from excessive pressure while maintaining cleaning reliability through consistent controlled cleaning
Data Source
AI summary
Some implementations described herein provide a reticle cleaning device and a method of use. The reticle cleaning device includes a support member configured for extension toward a reticle within an extreme ultraviolet lithography tool. The reticle cleaning device also includes a contact surface disposed at an end of the support member and configured to bond to particles contacted by the contact surface. The reticle cleaning device further includes a stress sensor configured to measure an amount of stress applied to the support member at the contact surface. During a cleaning operation in which the contact surface is moving toward the reticle, the stress sensor may provide an indication that the amount of stress applied to the support member satisfies a threshold. Based on satisfying the threshold, movement of the contact surface and/or the support member toward the reticle ceases to avoid damaging the reticle.