EUV Reticle Enclosure Elastomer Coating Friction Reduction

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Solution Overview

Problem

In extreme ultraviolet (EUV) lithography systems, friction between the inner pod cover and base generates particles that contaminate the environment and damage photo masks or substrates, leading to fabrication errors and increased production costs.

Innovation Solution

The inner pod cover and base are coated with a layer of elastomer or gelatinous material to reduce friction and minimize particle generation, using materials like natural rubbers or silicone elastomers to create a flexible interface that minimizes contact and sliding between the components.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If the inner pod cover and base are made with rigid surfaces for structural strength, then the mechanical strength is improved, but friction between the surfaces generates particles that contaminate the environment

Engineering Contradiction:
Improvemechanical strengthVSAvoidparticle generation
Core Design Contradiction:
StrengthVSObject-generated harmful factors

Solution Approach 1:

The patent applies flexible coating layers (elastomer or gelatinous material) on the inner pod cover and base surfaces. These flexible layers reduce friction and particle generation during relative movement while maintaining the structural integrity provided by the rigid underlying pod structure.

Inventive Principle:
Principle #30Flexible shells and thin films

Solution Approach 2:

The patent uses composite material structure combining rigid pod material (for strength) with flexible coating layers (elastomer or gelatinous material). This composite approach allows the rigid structure to provide mechanical strength while the flexible coating reduces friction and prevents particle generation during movement.

Inventive Principle:
Principle #40Composite materials

2Object-generated harmful factors

If a coating layer is applied to reduce friction and particle generation, then contamination is reduced, but the device structure becomes more complex

Engineering Contradiction:
ImprovecontaminationVSAvoidstructure complexity
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

The patent applies thin flexible coating layers (elastomer or gelatinous material) directly on the inner pod surfaces. These thin films reduce friction and particle generation without significantly increasing structural complexity, as they are applied as coatings rather than adding separate mechanical components.

Inventive Principle:
Principle #30Flexible shells and thin films

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution effectively reduces contamination and damage to the masks or substrates by minimizing particle generation due to friction, enhancing the mechanical properties of the inner pod and maintaining a clean environment within the EUV lithography system.

Implementation Method 1

a layer of elastomer or gelatinous material disposed on at least one of the first surface and the second surface

Methodology Applied
Scientific EffectElasticity: Elasticity

Implementation Method 2

The inner pod cover and base are coated with a layer of elastomer or gelatinous material to reduce friction

Methodology Applied
Scientific EffectLubrication: Lubrication

Data Source

PatentUS20240369921A1Reticle enclosure for lithography systems
Publication Date: 2024.11.07 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US20240369921A1 patent drawing
  • US20240369921A1 patent drawing
  • US20240369921A1 patent drawing

AI summary

A reticle enclosure includes a base including a first surface, a cover including a second surface and disposed on the base, wherein the base and the cover form an internal space therebetween to include a reticle, and a layer of elastomer or gelatinous material disposed on at least one of the first surface and the second surface, wherein the layer of elastomer or gelatinous material is disposed between the base and the cover and contacts either the base or the cover.