EUV Reticle Pellicle Assembly With IR/DUV Filtering for Scanner Uptime
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Solution Overview
Problem
Conventional dynamic gas lock (DGL) membranes in EUV scanners have a limited useful lifetime and require time-consuming replacement, leading to significant downtime and reduced semiconductor manufacturing throughput.
Innovation Solution
A pellicle assembly with a nanotube membrane is used to filter out-of-band wavelengths and protect the reticle from particles and contaminants, allowing the DGL membrane to be omitted without loss of functionality, thereby increasing EUV scanner uptime and throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a DGL membrane is used to filter out-of-band wavelengths and protect the reticle, then the reticle is protected from particles and contaminants, but the membrane has a limited useful lifetime and requires time-consuming replacement
Solution Approach 1:
The patent divides the protection function into two separate components: the DGL membrane for wavelength filtering and the pellicle membrane for particle protection. This segmentation allows each component to be optimized for its specific function and replaced independently, extending the overall system lifetime.
Solution Approach 2:
The pellicle membrane is designed to perform multiple functions: it protects the reticle from particles and contaminants, and when positioned in the optical path, it also filters out-of-band wavelengths. This multi-functionality reduces the need for separate components and extends operational lifetime.
2Manufacturing precision
If a DGL membrane is used to protect the reticle, then defects are reduced, but the membrane requires frequent replacement causing significant downtime
Solution Approach 1:
The pellicle membrane is installed in advance to provide continuous protection against particles and contaminants. Its long lifetime and durability mean it is already in place and functioning when the DGL membrane needs replacement, minimizing downtime and maintaining manufacturing precision throughout the process.
Solution Approach 2:
The DGL membrane is designed as a disposable, short-lifetime component that can be quickly replaced, while the more expensive and complex pellicle membrane serves as a long-lasting protective element. This strategy reduces overall downtime by separating the replacement frequency of different components.
3Productivity
If the DGL membrane is omitted to increase uptime, then scanner throughput increases, but the system loses wavelength filtering and reticle protection functionality
Solution Approach 1:
The pellicle membrane is designed to perform both protection and wavelength filtering functions. When positioned in the optical path, it filters out-of-band wavelengths while simultaneously protecting the reticle from particles, maintaining system reliability without requiring the separate DGL membrane.
Solution Approach 2:
The pellicle membrane acts as an intermediary component that provides the wavelength filtering and protection functions previously performed by the DGL membrane. It mediates between the optical path and the reticle, ensuring continuous functionality even when the DGL membrane is omitted or removed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The pellicle assembly effectively filters out-of-band wavelengths and protects the reticle, reducing defects and enabling continuous operation of the EUV scanner, thus enhancing semiconductor manufacturing efficiency by eliminating the need for frequent DGL membrane replacements.
Implementation Method 1
The nanotube material layer 460 absorbs or scatters out-of-band wavelengths (e.g., infrared (IR) and/or deep ultraviolet (DUV) wavelengths)
Implementation Method 2
the pellicle assembly 450 protects the reticle 410 from particles, debris and/or contaminates
Data Source
AI summary
A pellicle assembly is provided for an associated reticle of an extreme ultraviolet (EUV) scanner. The pellicle assembly includes: a pellicle membrane; and a frame configured to mount the pellicle membrane to the associated reticle. Suitably, the pellicle membrane includes: a nanotube material layer; a first protective layer; a second protective layer; an infrared (IR) active layer arranged between the first protective layer and the second protective layer, the IR active layer filtering out IR wavelengths of light passing therethrough; and a deep ultraviolet (DUV) active layer arranged between the first protective layer and the second protective layer, the DUV active layer filtering out DUV wavelengths of light passing therethrough.


