EUV Seed Module Pulse Path Separation for Stable Alignment
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Solution Overview
Problem
Current semiconductor manufacturing technologies face challenges in achieving stability and productivity in extreme ultraviolet (EUV) light source systems, which are crucial for next-generation micro-fabrication, due to limitations in pulse control and interference between pulses in EUV light generation.
Innovation Solution
A semiconductor manufacturing apparatus and method utilizing a seed module with a pulse control optical system, including a lens, to control and stabilize the paths of first and second pulses from seed lasers, ensuring they do not overlap, thereby improving the stability and alignment of pulses for efficient EUV light generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single optical path is used for both pulses, then device complexity is reduced, but pulse alignment precision and stability deteriorate due to interference between pulses
Solution Approach 1:
The optical path is segmented into a first optical path for the first pulse and a second optical path for the second pulse. The pulse control optical system is provided only on the second optical path, allowing independent control of each pulse path while maintaining overall system simplicity.
Solution Approach 2:
A pulse control optical system acting as an intermediary is introduced on the second optical path to precisely control the second pulse without affecting the first pulse. This mediator enables precise pulse alignment while maintaining device simplicity through selective placement.
2Manufacturing precision
If a pulse control optical system is added to control pulse paths, then pulse alignment precision is improved, but device complexity increases
Solution Approach 1:
The pulse control optical system is applied locally only on the second optical path where precise control is needed, rather than uniformly on both paths. This localized approach achieves necessary precision while minimizing overall device complexity.
Solution Approach 2:
The pulse control optical system is partially applied - only on the second optical path and not on the first optical path. This partial action provides sufficient pulse alignment precision without the excessive complexity of controlling both paths equally.
3Device complexity
If pulses travel along overlapping paths, then device complexity is reduced, but pulse stability deteriorates due to interference
Solution Approach 1:
The optical paths are segmented into separate first and second paths that do not overlap, eliminating pulse interference. The pulse control optical system on the second path further stabilizes the second pulse without affecting the first pulse.
Solution Approach 2:
The potential interference between pulses is extracted and eliminated by separating the optical paths. The pulse control system on the second path extracts and corrects any path deviations, ensuring pulse stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the stability and alignment of pulses, leading to improved productivity in semiconductor manufacturing by precisely generating extreme ultraviolet light, which is essential for next-generation micro-fabrication.
Implementation Method 1
an oscillation unit including a first seed laser, a second seed laser, and a seed module, wherein the first seed laser is configured to oscillate a first pulse, and wherein the second seed laser is configured to oscillate a second pulse
Implementation Method 2
The third optical element may include a lens between the first optical element and the second optical element
Implementation Method 3
an extreme ultraviolet generation unit configured to use the first and second pulses to generate extreme ultraviolet light
Data Source
AI summary
Disclosed are semiconductor manufacturing apparatuses and operating methods thereof. The semiconductor manufacturing apparatus includes an oscillation unit that includes a first seed laser, a second seed laser, and a seed module, wherein the first seed laser oscillates a first pulse, and wherein the second seed laser oscillates a second pulse, and an extreme ultraviolet generation unit configured to use the first and second pulses to generate extreme ultraviolet light. The seed module includes a plurality of mirrors configured to allow the first and second pulses to travel along first and second paths, respectively, and a pulse control optical system including a first optical element, a second optical element, and a third optical element. The pulse control optical system is on the second path that does not overlap the first path. The third optical element includes a lens between the first optical element and the second optical element.