EUV Light Generation System Asymmetric Sensor Placement
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Solution Overview
Problem
Current extreme ultraviolet (EUV) light generation systems for semiconductor manufacturing face challenges in achieving optimal EUV light output and efficiency due to limitations in laser irradiation position adjustment and debris generation, particularly when using EUV sensors with a geometric centroid aligned with the optical path axis.
Innovation Solution
The system adjusts the laser irradiation position based on radiation energy measurements from EUV sensors positioned away from the optical axis, optimizing the distribution of EUV light towards the EUV light concentrating mirror to enhance output energy while minimizing debris generation by shifting the geometric centroid of the EUV sensors to direct radiation energy towards the mirror.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If EUV sensors are positioned with geometric centroid aligned with the optical path axis, then the measurement system is simple and symmetric, but the EUV light distribution is not optimized towards the EUV light concentrating mirror
Solution Approach 1:
The patent positions the geometric centroid of the EUV sensors away from the optical path axis, creating an asymmetric arrangement. This asymmetric positioning allows the sensor system to detect EUV radiation distribution more effectively in the direction of the EUV light concentrating mirror, optimizing energy capture while maintaining measurement functionality.
2Ease of operation
If laser irradiation position is not adjusted, then the system operation is simple, but debris generation increases and EUV light output efficiency is reduced
Solution Approach 1:
The patent implements a feedback mechanism where EUV sensors measure radiation energy in different directions, and this measurement information is fed back to control the laser irradiation position adjustment mechanism. This closed-loop control optimizes the laser irradiation position to minimize debris generation while maximizing EUV light output efficiency.
Solution Approach 2:
The patent introduces dynamic adjustment capability to the laser irradiation position through the irradiation position adjustment mechanism. This allows the system to dynamically optimize the laser irradiation position based on real-time EUV radiation measurements, transforming a static system into a dynamic one that can adapt to minimize debris and maximize efficiency.
3Ease of operation
If laser irradiation position is not optimized, then the system is easier to operate, but the output energy of EUV light reaching the intermediate focal point is reduced
Solution Approach 1:
The patent uses EUV sensors to measure radiation energy in different directions and feeds this information back to control the laser irradiation position adjustment. This feedback loop enables the system to automatically optimize the laser irradiation position to maximize EUV light output energy reaching the intermediate focal point while maintaining operational simplicity through automated control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach increases the output energy of EUV light reaching the intermediate focal point and reduces debris generation by optimizing the EUV light distribution and adjusting the laser irradiation position to maximize radiation energy in the direction of the EUV light concentrating mirror.
Implementation Method 1
a laser device configured to output pulse laser light
Implementation Method 2
an EUV light concentrating mirror configured to reflect EUV light radiated from the first region and concentrate the EUV light to a second region
Data Source
AI summary
An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions, and having a geometric centroid located at a position away from the optical axis in a direction toward the EUV light concentrating mirror; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light.