EUV Sensor Purge Gas Flow Path Design

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The EUV optical sensor unit faces challenges such as space constraints, difficulty in gas flow between the filter and sensor, carbon accumulation reducing detection sensitivity, and pressure differences causing filter damage during EUV irradiation.

Innovation Solution

The EUV optical sensor unit incorporates a second gas supply part to direct purge gas between the filter and sensor, with a spacer to maintain distance and prevent carbon accumulation, and a flow path structure to manage pressure and reduce damage.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Volume of moving object

If the space between the wavelength filter and optical sensor is reduced to improve space efficiency, then the device size is minimized, but gas flow between the filter and sensor becomes difficult and carbon accumulation increases

Engineering Contradiction:
Improvedevice sizeVSAvoiddetection sensitivity
Core Design Contradiction:
Volume of moving objectVSReliability

Solution Approach 1:

A purge gas supply unit is introduced as an intermediary component between the wavelength filter and optical sensor. This unit supplies purge gas to the space between these components, preventing carbon accumulation on the filter surface while maintaining a compact device structure. The purge gas acts as a mediator that protects the optical path without requiring increased spacing between components.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If purge gas is supplied between the wavelength filter and optical sensor to prevent carbon accumulation, then detection sensitivity is improved, but pressure difference may cause filter damage

Engineering Contradiction:
Improvedetection sensitivityVSAvoidfilter durability
Core Design Contradiction:
ReliabilityVSStrength

Solution Approach 1:

The pressure parameters of the purge gas supply are precisely controlled to maintain a pressure difference within a specific range (0.1-10 Pa). By changing and optimizing the pressure parameter, the system achieves effective carbon prevention while avoiding excessive pressure that could damage the wavelength filter. The gas supply unit is designed to deliver gas at controlled flow rates and pressures.

Inventive Principle:
Principle #35Parameter changes

3Object-generated harmful factors

If the gap between filter and sensor is increased to allow gas flow, then carbon accumulation is reduced, but space efficiency and device compactness deteriorate

Engineering Contradiction:
Improvecarbon accumulationVSAvoiddevice volume
Core Design Contradiction:
Object-generated harmful factorsVSVolume of moving object

Solution Approach 1:

A purge gas supply system is implemented using pneumatic principles. The system introduces inert gas (such as nitrogen or helium) into the space between the wavelength filter and optical sensor at controlled pressure. This pneumatic approach effectively removes carbon accumulation through gas flow while maintaining a compact device structure, as the gas can flow effectively in small spaces without requiring large gaps.

Inventive Principle:
Principle #29Pneumatics and hydraulics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enhances detection sensitivity by reducing carbon accumulation and minimizes filter damage, ensuring accurate energy measurement while maintaining space efficiency.

Implementation Method 1

a mirror configured to reflect extreme ultraviolet light

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 2

a wavelength filter configured to selectively transmit the extreme ultraviolet light reflected by the mirror

Methodology Applied
Scientific EffectOptical filtering: Filter (optical)

Implementation Method 3

an optical sensor configured to detect the extreme ultraviolet light having transmitted through the wavelength filter

Methodology Applied
Scientific EffectPhotoelectric effect: Photoelectric Effect

Data Source

PatentUS11125613B2Extreme ultraviolet light sensor unit and extreme ultraviolet light generation apparatus
Publication Date: 2021.09.21 GIGAPHOTON INC
  • US11125613B2 patent drawing
  • US11125613B2 patent drawing
  • US11125613B2 patent drawing

AI summary

An extreme ultraviolet light sensor unit according to one aspect of the present disclosure includes: a mirror configured to reflect extreme ultraviolet light; a wavelength filter configured to selectively transmit the extreme ultraviolet light reflected by the mirror; an optical sensor configured to detect the extreme ultraviolet light having transmitted through the wavelength filter; and a purge gas supply unit disposed to supply purge gas to a space between the wavelength filter and the optical sensor.