EUV Source Chamber Insert Segmentation for Debris Management
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Solution Overview
Problem
Existing EUV radiation sources face contamination issues due to deposits at the exit opening, which impair the radiation beam and require effective removal to maintain beam quality.
Innovation Solution
The insert for the EUV radiation source is designed to spatially separate functions such as pressure difference creation and beam passage, using distinct constituent parts to minimize contamination impact on the beam. The first region acts as a sacrificial area for debris deposition, while the second region, acting as an aperture stop, is offset to reduce debris accumulation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the exit opening region is used for beam passage, then the beam geometry is defined, but deposits occur at the exit opening which impair the beam quality
Solution Approach 1:
The insert is divided into two functionally separate regions: a first region (sacrificial region) that is offset from the beam exit direction and serves as a deposition zone, and a second region (aperture stop region) that defines the beam geometry. This segmentation allows the harmful deposition function to be separated from the useful beam definition function, preventing deposits from limiting the optically used beam cone while maintaining precise beam geometry control at the aperture stop.
2Manufacturing precision
If the aperture stop is positioned at the exit opening to define beam geometry, then precise beam control is achieved, but debris deposition at this location limits beam quality
Solution Approach 1:
The first region acts as an intermediary sacrificial zone positioned between the plasma source and the aperture stop. This intermediary region absorbs debris deposits that would otherwise reach the aperture stop, protecting the beam-defining region from contamination and maintaining reliable beam quality over extended operation periods.
3Device complexity
If a single region serves both pressure separation and beam passage functions, then device complexity is reduced, but contamination affects both functions simultaneously
Solution Approach 1:
The insert is segmented into two distinct regions with different functions: the first region provides pressure separation and acts as a sacrificial deposition zone, while the second region serves as the aperture stop for beam passage. This functional segmentation ensures that contamination affects only the sacrificial region, leaving the beam passage region clean and effective.
Data Source
AI summary
An insert for a source chamber of an EUV radiation source has a pressure stage and, spaced apart from it, a stop.