EUV Substrate Precursor Titanium Gradient Control
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Solution Overview
Problem
The production of TiO2-SiO2 mixed glass substrates for EUV lithography faces challenges with macroscopic titanium gradients and microscopic layer structures, which affect the quality and homogeneity of the substrates, especially when producing large masses exceeding 50 kg, leading to imaging errors and reduced numerical aperture.
Innovation Solution
A method involving the introduction of silicon dioxide and titanium dioxide raw materials into a flame, followed by specific processing steps including division, spatial measurement, homogenization treatments, and reconfiguration to minimize titanium gradients and layer structures, optimizing the spatial distribution of titanium dioxide within the substrate precursor.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If the substrate precursor mass is increased to achieve larger mirror substrates for higher numerical aperture, then the numerical aperture and imaging resolution are improved, but macroscopic titanium gradients and microscopic layer structures become more pronounced, degrading substrate quality
Solution Approach 1:
The glass body is divided into multiple rod-like glass body sections, which are then individually processed and reassembled. This segmentation allows for targeted homogenization treatment of each section to reduce titanium gradients and layer structures while maintaining the overall large mass required for high numerical aperture mirrors
Solution Approach 2:
Homogenization treatment is performed on the glass body sections before final assembly into the substrate precursor. This preliminary homogenization reduces titanium gradients and layer structures in advance, ensuring uniform titanium distribution is achieved before the sections are combined into the large-mass final product
2Measurement precision
If EUV source power is increased to achieve smaller linewidths, then the linewidth resolution is improved, but mirror heating increases, requiring more homogeneous mirrors which conflicts with manufacturing-related titanium gradients
Solution Approach 1:
The homogenization treatment is applied specifically to regions where titanium gradients and layer structures are most problematic, creating local quality improvements in titanium distribution homogeneity without requiring a complete redesign of the entire manufacturing process for large-mass substrates
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the production of substrate precursors with reduced macroscopic titanium gradients and microscopic layer structures, achieving higher numerical aperture and improved imaging properties suitable for EUV lithography, even for large masses exceeding 100 kg.
Implementation Method 1
Introducing a silicon dioxide raw material and a titanium dioxide raw material into a flame
Implementation Method 2
first homogenization treatment of the first glass component, second homogenization treatment of the second glass component
Data Source
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AI summary
The invention relates to a method for producing a substrate precursor (900) with a mass of more than 100kg. A glass body (300) with a titanium dioxide content of 3 wt.% to 10 wt.% is produced, wherein the glass body (300) exhibits: • a macroscopic, manufacturing-related titanium gradient (410, 410', 410", 410‴), and • a microscopic, manufacturing-related layered structure. The process comprises the following steps: • dividing (1200) the glass body into a plurality of rod-like glass body sections (400, 400', 400", 400‴), • spatially measuring (1300) the titanium gradient (410, 410', 410", 410‴) in each of the glass body sections (400, 400', 400", 400‴), • joining (1500) the glass body sections (400, 400', 400", 400‴) to form an elongated first glass component (600), homogenization treatments and forming to create a layer-free substrate precursor (900).The Measure step comprises the following steps: • Predetermining (1400) a desired spatial titanium distribution (420) in the substrate precursor (900), • Providing (1420) a model of a titanium distribution (430) in the substrate precursor (900), wherein the model depends on • an arrangement of the majority of the vitreous sections (400, 400', 400", 400''), • the spatial titanium distribution (410, 410', 410", 410'"), and • the effects of the Push Together (1700) and Turn (1800) steps on the spatial titanium distributions (410, 410', 410", 410'"), • Calculating (1450) an optimal arrangement of the vitreous sections (400, 400', 400", 400'") relative to each other using the model. so that the difference between titanium partition (430) and titanium distribution (420) is minimal, • Positioning (1470) the glass body sections (400, 400', 400", 40''') according to the calculated optimal arrangement.