EUV Target Supply Buffer Tank Pressure Stabilization
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Solution Overview
Problem
Existing target supply systems for extreme ultraviolet light generation in semiconductor manufacturing face challenges in maintaining stable gas pressure and target velocity due to temperature fluctuations and solid target substance supply, which affects the quality and stability of the EUV light generated.
Innovation Solution
The proposed target supply system includes a load lock chamber, a melting tank, a pressure regulator, and a buffer tank. The buffer tank communicates with the melting tank to stabilize gas pressure by supplying gas when the solid target substance is supplied, thus maintaining consistent target velocity and EUV light quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If solid target substance is supplied to the melting tank, then the target substance can be continuously replenished, but gas pressure fluctuations occur due to temperature changes
Solution Approach 1:
The buffer tank serves as an intermediary component between the gas pressure supply pipe and the melting tank. It receives regulated gas pressure from the pressure regulator and supplies it to the melting tank, isolating the melting tank from direct pressure fluctuations caused by solid target substance supply. This mediator tank absorbs pressure variations and provides stable gas pressure for melting the target substance.
Solution Approach 2:
The buffer tank is pre-filled with gas and connected to the pressure regulator before the solid target substance is supplied to the melting tank. This beforehand preparation creates a cushion of gas pressure that compensates for future pressure drops when solid target substance is introduced, preventing instability before it occurs.
2Ease of operation
If gas pressure is regulated externally, then gas supply control is simplified, but pressure fluctuations still affect target velocity
Solution Approach 1:
The buffer tank acts as an intermediary between the pressure regulator and the melting tank, decoupling the external gas pressure control from the internal melting tank pressure. While the pressure regulator provides ease of operation for gas supply control, the buffer tank mediates its effect, filtering out pressure fluctuations that would otherwise directly impact target velocity.
Solution Approach 2:
The buffer tank is pre-charged with gas at regulated pressure before the melting process begins. This beforehand cushioning creates a pressure reservoir that maintains stable target velocity even when external gas pressure regulation occurs, as the buffer tank compensates for pressure variations.
3Productivity
If solid target substance is melted to generate liquid target, then continuous liquid target can be supplied, but temperature changes cause pressure instability
Solution Approach 1:
The buffer tank serves as a mediator between the gas pressure supply system and the melting tank. It receives regulated gas pressure and supplies it to the melting tank, isolating the melting process from external pressure fluctuations. This allows continuous liquid target supply while maintaining pressure stability.
Solution Approach 2:
The buffer tank is pre-filled with gas at regulated pressure before the solid target substance is melted. This beforehand cushioning creates a pressure reservoir that compensates for temperature-induced pressure changes during the melting process, ensuring stable pressure for continuous liquid target supply.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively suppresses gas pressure fluctuations in the melting tank, stabilizes the velocity of the target, and enhances the stability and quality of the EUV light generated, improving the overall efficiency and reliability of the semiconductor manufacturing process.
Implementation Method 1
a melting tank connected to both the solid target supply pipe and the gas pressure supply pipe, and configured to melt the solid target substance supplied from the load lock chamber via the solid target supply pipe to generate a liquid target substance
Implementation Method 2
a buffer tank configured to communicate with the melting tank and supply a gas pressure thereto when the solid target substance is supplied to the melting tank
Implementation Method 3
a nozzle configured to discharge the liquid target substance by a gas pressure supplied from the pressure regulator to the melting tank via the gas pressure supply pipe
Implementation Method 4
a laser produced plasma (LPP) type apparatus using plasma generated by irradiating a target substance with pulse laser light
Data Source
AI summary
A target supply system includes a load lock chamber configured to contain a solid target substance, a solid target supply pipe connected to the load lock chamber, a pressure regulator configured to regulate an externally supplied gas pressure, a gas pressure supply pipe connected to the pressure regulator, a melting tank connected to both the solid target supply pipe and the gas pressure supply pipe, and configured to melt the solid target substance supplied from the load lock chamber via the solid target supply pipe to generate a liquid target substance, a nozzle configured to discharge the liquid target substance by a gas pressure supplied from the pressure regulator to the melting tank via the gas pressure supply pipe, and a buffer tank configured to communicate with the melting tank and supply a gas pressure thereto when the solid target substance is supplied to the melting tank.