EUV Light Generation Apparatus Target Droplet Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current EUV light generation systems for semiconductor production face challenges in stabilizing the energy of outputted EUV light due to variations in the size of target droplets and position within the plasma generation region, which affects the precision and efficiency of microfabrication processes for feature sizes below 32 nm.
Innovation Solution
An EUV light generation apparatus incorporating an electrostatic-pull-out type target supply unit, which includes a target storage unit, nozzle unit, electrode, and pressure adjuster, controlled by a controller to stabilize the size and generation frequency of target droplets, ensuring precise targeting and energy stability through DC voltage and pressure adjustments based on real-time detection signals.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional target supply methods are used, then the system is simpler, but the target size and position vary, causing EUV light energy instability
Solution Approach 1:
A detector detects the target droplet's size and position, and the controller adjusts the DC voltage and gas pressure based on detection signals to stabilize target characteristics. This closed-loop feedback control ensures stable EUV light energy output by continuously monitoring and correcting target droplet variations.
Solution Approach 2:
The system dynamically adjusts DC voltage and gas pressure during operation to maintain optimal target droplet characteristics. The controller modifies electrical and pressure parameters in real-time based on detected target variations, enabling adaptive stabilization of EUV light energy.
2Manufacturing precision
If target droplet size and position are not controlled, then the system operation is simpler, but microfabrication precision deteriorates
Solution Approach 1:
The detector monitors target droplet characteristics and provides feedback to the controller, which adjusts DC voltage and gas pressure to maintain precise target positioning and sizing. This automated feedback loop ensures high microfabrication precision without requiring manual intervention.
Solution Approach 2:
The system replaces manual mechanical adjustment with automated electrostatic control. DC voltage and gas pressure control substitute for mechanical positioning methods, enabling precise target droplet control through electrical and pressure fields rather than mechanical manipulation.
3Stability of the object's composition
If DC voltage and pressure are adjusted based on detection signals, then target consistency improves, but control system complexity increases
Solution Approach 1:
The controller receives detection signals about target droplet characteristics and automatically adjusts DC voltage and gas pressure to maintain consistent target composition. This feedback-controlled adjustment mechanism ensures target droplet consistency while managing control complexity through automated regulation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves stabilized target size and generation frequency, leading to improved precision and consistency in EUV light output, enhancing the capability for microfabrication with feature sizes below 32 nm by ensuring precise targeting and energy stability.
Implementation Method 1
a direct current voltage adjuster configured to apply a direct current between the target material and the electrode
Implementation Method 2
a pressure adjuster configured to apply a pressure to the target material through gas
Implementation Method 3
a Laser Produced Plasma (LPP) type system in which plasma is generated by irradiating a target material with a laser beam
Data Source
AI summary
An apparatus used with an external laser apparatus for generating extreme ultraviolet light includes a target storage unit for storing a target material, a nozzle unit having a through-hole in communication with the interior of the storage unit through which the target material is outputted, an electrode having a through-hole facing the nozzle unit, and a target detector for detecting a target formed of the target material and outputting a detection signal. A direct current voltage adjuster applies and adjusts a direct current between the target material and the electrode, a pressure adjuster applies and adjusts a pressure to the target material through gas, and a controller controls at least one of the direct current voltage adjuster and the pressure adjuster based on the detection signal from the target detector.