EUV Target Supply Electrode Heating for Liquid Flow Control
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Solution Overview
Problem
In the production of semiconductor devices with feature sizes of 32 nm or less, existing EUV light generation systems face challenges in efficiently generating and directing targets for plasma creation, leading to issues such as target trajectory deviations and accumulation on electrodes, which affect the output and efficiency of EUV light generation.
Innovation Solution
A target supply device comprising a tank, first and second electrodes, and a heating unit, where the second electrode is designed with a collection portion and temperature control to manage target material flow and trajectory, preventing accumulation and ensuring proper output by heating the electrode to the melting point of the target material, thus maintaining the target in a liquid state and preventing branch-like buildup.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the second electrode is heated to the melting point of the target material, then the target material is maintained in a liquid state and accumulation is prevented, but the device complexity increases due to the heating unit and temperature control system
Solution Approach 1:
The second electrode is heated to change the physical state of the target material from solid to liquid, fundamentally altering its flow properties. This parameter change (temperature) enables the liquid target material to flow smoothly along the electrode surface and through the through-hole, preventing accumulation and ensuring accurate trajectory control.
Solution Approach 2:
The patent replaces mechanical target delivery systems with a thermally-controlled liquid flow system. Instead of mechanically transporting solid targets, the system uses thermal energy to maintain liquid state and enables natural flow under gravity and surface tension, substituting mechanical complexity with thermal control.
2Loss of substance
If the collection portion is designed to extend from the circumferential edge of the second through-hole, then target material accumulation is prevented, but the manufacturing precision requirements increase for the electrode structure
Solution Approach 1:
The collection portion is designed with a curved, cylindrical geometry that extends from the circumferential edge of the through-hole. This curved structure naturally guides the liquid target material away from the through-hole region, preventing accumulation through smooth geometric transitions rather than sharp edges or complex mechanisms.
Solution Approach 2:
The second electrode is segmented into distinct functional regions: the main body with the through-hole for target ejection, and the collection portion for capturing and redirecting excess material. This segmentation allows each region to perform its specific function independently, improving overall material flow control.
3Measurement precision
If the target material is kept in liquid state through heating, then trajectory deviations are reduced, but the energy consumption increases
Solution Approach 1:
The heating unit operates continuously to maintain the second electrode at the melting point temperature, ensuring the target material remains in liquid state throughout the entire target supply process. This continuous thermal action eliminates trajectory deviations caused by phase changes or solidification, maintaining consistent liquid flow and accurate targeting.
Solution Approach 2:
The second electrode acts as an intermediary medium between the target material reservoir and the plasma generation zone. By heating this intermediary electrode, the system controls the physical state of the target material during its critical transition phase, ensuring it remains liquid and flows accurately without direct heating of the target material itself.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents target material buildup on electrodes, ensures accurate target trajectory, and enhances the efficiency of EUV light generation by maintaining targets in a liquid state, thereby improving the output and reducing the risk of insulation breakdown and directional deviations.
Implementation Method 1
a heating unit configured to heat the second electrode
Implementation Method 2
a collection portion formed in a cylindrical shape extending in a direction from a circumferential edge of the second through-hole toward the nozzle
Data Source
AI summary
A target supply device may include a tank including a nozzle, a first electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second electrode that includes a main body portion provided with a second through-hole and a collection portion formed in a cylindrical shape extending in a direction from a circumferential edge of the second through-hole toward the nozzle and that is disposed so that the center axis of the nozzle is positioned within the second through-hole, a third electrode disposed within the tank, and a heating unit configured to heat the second electrode.