EUV Target Supply Device Electrostatic Extraction Control
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Solution Overview
Problem
Current semiconductor production processes face challenges in microfabrication with feature sizes of 32 nm or less, particularly in generating EUV light for next-generation semiconductor devices, as existing target supply methods struggle to efficiently extract and manage target materials during plasma generation in EUV light generation systems.
Innovation Solution
A target supply device and method that utilize a pressure control unit, electrostatic extraction, and potential application to manage pressure and potential differences within a target generation unit, ensuring precise extraction of target materials through a nozzle with electrostatic force, preventing short-circuiting and ensuring accurate output direction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If pressure is raised inside the target generation unit to extract target material, then extraction efficiency is improved, but target material may scatter in unwanted directions
Solution Approach 1:
The patent applies different potentials to different regions (target material vs. surrounding area) to achieve localized control. By applying a constant potential to the target material and a pulse voltage to the extraction electrode, the system creates a localized electrostatic field that directs material flow precisely through the nozzle while preventing scattering in unwanted directions.
Solution Approach 2:
The patent uses equipotential surfaces created by the electrostatic field to control target material movement. By maintaining a constant potential on the target material and applying pulsed potential to the electrode, the system creates controlled equipotential regions that guide material flow along desired paths while preventing deviation.
2Measurement precision
If electrostatic force is used to extract target material, then extraction precision is improved, but short-circuiting may occur between electrode and target material
Solution Approach 1:
The patent applies pulse voltage periodically to the extraction electrode rather than continuous voltage. This periodic action allows the electrostatic field to be activated only when needed for extraction, reducing the risk of continuous short-circuiting while maintaining precise extraction control during the pulse duration.
Solution Approach 2:
The patent dynamically adjusts the potential applied to the electrode and target material based on operational needs. By switching between constant potential and pulse voltage modes, and adjusting potential magnitudes, the system optimizes extraction precision while preventing short-circuit conditions.
3Manufacturing precision
If potential difference is applied to control target material direction, then output direction accuracy is improved, but system complexity increases
Solution Approach 1:
The patent controls target material direction by changing electrical potential parameters (magnitude, timing, waveform) rather than modifying the physical structure. By adjusting the constant potential level and pulse voltage characteristics, the system achieves precise directional control without adding complex mechanical or structural components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables efficient and precise extraction of target materials, preventing short-circuiting and ensuring accurate output, even when the target output direction is slanted, thereby maintaining system integrity and performance in EUV light generation systems.
Implementation Method 1
raising the pressure inside the target generation unit to a setting pressure by the actuator based on a detection result of the pressure inside the target generation unit detected by the pressure sensor
Implementation Method 2
an electrode configured to extract the target material through a nozzle hole of the nozzle with electrostatic force
Implementation Method 3
applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit in order to extract the target material with the electrostatic force
Data Source
AI summary
A target supply method uses a target supply device that includes a target generation unit having a nozzle, a pressure control unit having a pressure sensor and an actuator, an electrode, a potential application unit, and a timer; further, the method include raising the pressure inside the target generation unit to a setting pressure by the actuator, applying different potentials to the electrode and a target material from each other by the potential application unit in the case where it is detected that the pressure inside the target generation unit is halfway raised to the setting pressure, and applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit to extract the target material with electrostatic force in the case where it is detected that the pressure inside the target generation unit has been raised to the setting pressure.