EUV Target Supply Nozzle Offset for Insulation Integrity

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Solution Overview

Problem

In EUV light generation systems for semiconductor production, existing target supply devices face challenges in maintaining insulation integrity and controlling the trajectory of targets due to mist formation and charge distribution, leading to potential insulation breakdown and misdirection of charged targets.

Innovation Solution

The target supply device incorporates a tank with a nozzle, multiple electrodes, and projecting portions to anchor and position the nozzle for insulation and to prevent mist adherence, ensuring the targets are accurately directed and maintaining insulation integrity by using anchoring and projecting portions to manage the electrical field and trajectory.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If the nozzle is positioned close to the electrodes for compact design, then device complexity is reduced, but insulation breakdown occurs due to mist adherence and charge distribution

Engineering Contradiction:
Improvedevice complexityVSAvoidinsulation integrity
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent introduces a spatial dimension by positioning the nozzle off-center relative to the electrode axes. The nozzle center is deliberately offset from both the first electrode axis and the second electrode axis, creating a three-dimensional arrangement that maintains insulation distance while achieving compact design. This dimensional repositioning resolves the contradiction by allowing close proximity without direct alignment that would cause insulation breakdown.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Ease of manufacture

If the nozzle is aligned with the electrode centers for simplified structure, then ease of manufacture is improved, but target trajectory control deteriorates due to mist formation and charge distribution

Engineering Contradiction:
Improveease of manufactureVSAvoidtarget trajectory control
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent moves the nozzle positioning from a two-dimensional plane (aligned with electrode centers) to a three-dimensional off-center position. The nozzle center is positioned at coordinates that are offset from both electrode axes, creating a unique spatial arrangement that simplifies manufacturing while improving target trajectory control by reducing mist interference and charge distribution effects.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Device complexity

If the electrodes are positioned close together for compact design, then device complexity is reduced, but insulation breakdown occurs

Engineering Contradiction:
Improvedevice complexityVSAvoidinsulation integrity
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent resolves the insulation breakdown issue by repositioning the nozzle in three-dimensional space rather than simply increasing electrode spacing. The off-center positioning allows the nozzle to be closer to the electrodes without causing insulation breakdown, as the spatial offset prevents direct alignment that would lead to charge accumulation and insulation failure.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration effectively prevents insulation breakdown and maintains the correct trajectory of targets, ensuring reliable EUV light generation by suppressing mist adherence and charge distribution issues, thereby enhancing the operational stability and accuracy of the target supply.

Implementation Method 1

The anchoring portion is configured to anchor the first electrode and the second electrode to the tank so that the nozzle remains insulated from the first electrode, the nozzle remains insulated from the second electrode, and the first electrode remains insulated from the second electrode

Methodology Applied
Scientific EffectElectrical insulation: Electrical Resistance

Implementation Method 2

The first electrode may be provided with a first through-hole. The second electrode may be provided with a second through-hole. The third electrode may be disposed within the tank.

Methodology Applied
Scientific EffectElectrical field: Electric Field

Implementation Method 3

a Laser Produced Plasma (LPP) type system in which plasma is generated by irradiating a target material with a laser beam

Methodology Applied
Scientific EffectLaser produced plasma: Laser Ablation

Implementation Method 4

a Discharge Produced Plasma (DPP) type system in which plasma is generated by electric discharge

Methodology Applied
Scientific EffectElectric discharge: Electric Arc

Data Source

PatentUS8927951B2Target supply device
Publication Date: 2015.01.06 GIGAPHOTON INC
  • US8927951B2 patent drawing
  • US8927951B2 patent drawing
  • US8927951B2 patent drawing

AI summary

A target supply device may include a tank having a nozzle, a first electrode provided with a first through-hole, a second electrode provided with a second through-hole, a third electrode disposed within the tank, an anchoring portion configured to anchor the first electrode and the second electrode to the tank so that insulation among the nozzle, the first electrode, and the second electrode is maintained, and so that a center axis of the nozzle is positioned within the first through-hole and the second through-hole, a first projecting portion that is an integrated part of at least one of the first electrode and the second electrode and that is configured to project toward the nozzle, and a second projecting portion that is an integrated part of at least the second electrode and that is configured to project so as to be positioned between the first electrode and the second electrode.