EUV Target Supply Device Pressure Control for Jet Trajectory Alignment
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Solution Overview
Problem
In the context of EUV light generation for semiconductor production, existing target supply devices face challenges in accurately directing and maintaining the trajectory of target material jets, leading to deviations from set trajectories, which affects the efficiency and accuracy of plasma generation.
Innovation Solution
A control method and device configuration for the target supply system that includes an image sensor to monitor the output direction of the target material and adjust pressure within the target generator to ensure the jet trajectory aligns with a predetermined range, using a pressure control unit and a control unit to manage the pressure and output of the target material from a nozzle, ensuring proper alignment and direction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If pressure within the target generator is increased to output target material from the nozzle, then the target material can be successfully ejected, but the output direction may deviate from the set trajectory
Solution Approach 1:
The patent employs an image sensor to detect the actual output direction of the target material jet and feeds this information back to the control unit. The control unit compares the detected direction with the set trajectory and adjusts the pressure control unit accordingly to correct any deviation, ensuring the jet follows the intended path while maintaining adequate output.
Solution Approach 2:
The system dynamically adjusts the pressure parameter within the target generator based on real-time feedback from the image sensor. By changing the pressure level and timing, the control unit optimizes both the ejection of target material and its directional accuracy, resolving the contradiction between productivity and precision.
2Productivity
If pressure control is used to output target material, then material ejection is achieved, but directional control becomes difficult to maintain
Solution Approach 1:
The image sensor continuously monitors the jet direction and provides real-time feedback to the control unit. This closed-loop control system automatically adjusts pressure parameters to maintain the correct trajectory, making directional control easier and more reliable without requiring manual intervention.
Solution Approach 2:
The patent replaces manual or mechanical directional control mechanisms with an automated optical detection and electronic control system. The image sensor and control unit work together to automatically adjust pressure-based ejection, substituting complex mechanical alignment systems with a more precise and easier-to-operate electronic feedback system.
3Device complexity
If the target generator operates without continuous pressure adjustment, then the system is simpler, but trajectory deviation occurs
Solution Approach 1:
The patent implements a feedback control system where the image sensor detects jet direction and the control unit adjusts pressure accordingly. This automated feedback mechanism achieves high trajectory precision without requiring overly complex mechanical adjustment mechanisms, balancing device complexity with manufacturing precision.
Solution Approach 2:
Instead of using complex mechanical structures to control trajectory, the system changes pressure parameters dynamically through electronic control. This approach achieves precise trajectory control while keeping the overall device structure relatively simple, as electronic pressure control is more compact and easier to implement than mechanical adjustment systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach ensures that the target material is outputted with a trajectory that matches the set direction, enhancing the accuracy and efficiency of EUV light generation, thereby improving the semiconductor production process.
Implementation Method 1
outputting the target material in the target generator from a nozzle hole in the nozzle by pressurizing the interior of the target generator
Implementation Method 2
a difference between an output direction of the target material outputted from the nozzle hole that is detected by the image sensor
Data Source
AI summary
A control method for a target supply device may employ a target supply device, provided in an EUV light generation apparatus including an image sensor, that includes a target generator having a nozzle and configured to hold a target material and a pressure control unit configured to control a pressure within the target generator, and the method may include outputting the target material in the target generator from a nozzle hole in the nozzle by pressurizing the interior of the target generator using the pressure control unit, determining whether or not a difference between an output direction of the target material outputted from the nozzle hole that is detected by the image sensor and a set direction is within a predetermined range, and holding the pressure in the target generator using the pressure control unit until the difference falls within the predetermined range.