EUV Target Generation Device Pulse Duration Control

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Solution Overview

Problem

In EUV light generation systems, satellite droplets are generated alongside the target material, contaminating chamber components and not contributing to EUV light production, requiring effective suppression to maintain system cleanliness and efficiency.

Innovation Solution

A target generation device controlled by a pulse voltage system that detects and suppresses satellite droplets by adjusting the pulse duration of the voltage applied to the target generator, ensuring that the pulse duration falls within a range where satellite generation is minimized, using a controller to determine optimal pulse durations based on target diameter and experimental data.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the pulse duration is extended to ensure complete vaporization of the target material, then the target generation efficiency is improved, but satellite droplets are generated which contaminate chamber components

Engineering Contradiction:
Improvetarget generation efficiencyVSAvoidsatellite droplet generation
Core Design Contradiction:
ProductivityVSObject-generated harmful factors

Solution Approach 1:

The patent applies parameter changes by precisely controlling the pulse duration of the voltage applied to the target generator. By optimizing the pulse duration to fall within a specific range (0.1 ms to 10 ms), the system achieves complete vaporization of the target material while preventing satellite droplet formation. This parameter optimization resolves the contradiction between target generation efficiency and satellite droplet suppression.

Inventive Principle:
Principle #35Parameter changes

2Object-generated harmful factors

If the pulse duration is shortened to suppress satellite droplet generation, then chamber contamination is reduced, but target material vaporization may be incomplete

Engineering Contradiction:
Improvesatellite droplet generationVSAvoidtarget material vaporization completeness
Core Design Contradiction:
Object-generated harmful factorsVSManufacturing precision

Solution Approach 1:

The patent determines the optimal pulse duration range (0.1 ms to 10 ms) through systematic parameter changes and experimental verification. This optimized parameter range ensures that the target material is completely vaporized to produce sufficient EUV light while simultaneously suppressing satellite droplet generation, thus resolving the contradiction between vaporization completeness and satellite suppression.

Inventive Principle:
Principle #35Parameter changes

3Ease of operation

If a fixed pulse duration is used for target generation, then the system operation is simplified, but optimal performance varies with different target diameters and conditions

Engineering Contradiction:
Improvesystem operation simplicityVSAvoidEUV light generation efficiency
Core Design Contradiction:
Ease of operationVSProductivity

Solution Approach 1:

The patent incorporates a feedback mechanism where the controller determines the appropriate pulse duration based on detector signals that monitor target generation conditions. The detector detects whether a target is generated and whether it includes multiple droplets, providing feedback to the controller which then adjusts the pulse duration accordingly. This feedback loop maintains high EUV light generation efficiency while adapting to different operating conditions without requiring complex manual adjustments.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Effectively suppresses satellite droplets, preventing contamination of chamber components and ensuring efficient EUV light generation by adjusting pulse durations to prevent satellite formation, thereby maintaining system cleanliness and operational efficiency.

Implementation Method 1

a target generator configured to generate a droplet of a target material when driven by a pulse voltage

Methodology Applied
Scientific EffectPulse voltage: Electrostatics

Implementation Method 2

a detector configured to detect a target generated by the target generator and output a detection signal of the target

Methodology Applied
Scientific EffectDetection signal:

Data Source

PatentUS8705035B2Target generation device
Publication Date: 2014.04.22 GIGAPHOTON INC
  • US8705035B2 patent drawing
  • US8705035B2 patent drawing
  • US8705035B2 patent drawing

AI summary

A device for determining a target generation condition for a target generator which is driven by a pulse voltage to generate a droplet of a target material may include a detector configured to detect a target generated by the target generator and output a detection signal of the target, and a controller configured to control a pulse duration of the pulse voltage for driving the target generator. The controller can determine whether or not a target is generated by the target generator based on the detection signal, and determine whether or not the generated target includes a plurality of droplets based on the detection signal.