EUV Target Recovery Receiver Vibration for Mirror Reflectance
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Solution Overview
Problem
In extreme ultraviolet (EUV) light generation devices, the accumulation of targets on recovery apparatuses leads to reduced reflectance of EUV focusing mirrors, causing instability in EUV light generation due to splash and dendritic deposition, which impede the generation of high-quality EUV light for semiconductor processing.
Innovation Solution
A target recovery apparatus with a receiver inclined to the target trajectory and an excitation device that vibrates the receiver to prevent target accumulation, ensuring the target is received and stored as a liquid, thereby preventing splash and dendritic deposition on the EUV focusing mirror.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If the target recovery apparatus uses a stationary receiver to receive targets, then the structure is simple, but target accumulation occurs leading to reduced reflectance of EUV focusing mirrors
Solution Approach 1:
The receiver is changed from a stationary component to a movable one that can oscillate in a predetermined direction. This dynamic capability allows the receiver to prevent target accumulation by continuously changing its surface orientation relative to the incoming targets, thereby maintaining EUV light generation stability without significantly increasing structural complexity
Solution Approach 2:
The receiver is configured to oscillate in a predetermined direction, creating a vibrating surface that prevents targets from accumulating. This mechanical vibration disrupts the deposition process, ensuring that targets do not build up on the receiver surface and compromise the reflectance of EUV focusing mirrors
2Ease of operation
If targets are allowed to accumulate on the receiver, then the device operation is simple, but splash and dendritic deposition occur impeding high-quality EUV light generation
Solution Approach 1:
The oscillating receiver dynamically changes its orientation to prevent targets from settling and accumulating. This continuous motion disrupts the formation of splash and dendritic deposition, eliminating harmful effects while maintaining operational simplicity through automated oscillation control
Solution Approach 2:
The receiver oscillates in advance to prevent target accumulation before it can lead to splash and dendritic deposition. By continuously moving the receiver surface, the system proactively counteracts the harmful deposition process, preventing rather than remedying the harmful effects
3Productivity
If the receiver is positioned perpendicular to target trajectory for optimal reception, then target reception efficiency is maximized, but target accumulation occurs on the receiver surface
Solution Approach 1:
The receiver oscillates in a predetermined direction that is not parallel to the target trajectory, creating a dynamic surface that maintains high reception efficiency while preventing accumulation. The oscillation ensures that targets are distributed rather than concentrated on any single area of the receiver surface
Solution Approach 2:
The receiver oscillation adds a temporal dimension to the reception process. By varying the receiver orientation over time, the system transforms a static two-dimensional reception problem into a three-dimensional dynamic process, preventing accumulation while maintaining efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration stabilizes EUV light generation by maintaining high reflectance of the EUV focusing mirror, ensuring consistent and high-quality EUV light output for semiconductor processing, even during extended operation.
Implementation Method 1
an excitation device configured to vibrate the receiver
Implementation Method 2
configured to receive the target by allowing the target not irradiated with the laser light to collide with the receiver
Data Source
AI summary
An EUV light generation device generates EUV light stably. The EUV light generation device may include a chamber in which extreme ultraviolet light is generated when a target is irradiated with laser light in a predetermined region inside the chamber, a target supply device configured to output the target to the predetermined region in the chamber to thereby supply the target to the predetermined region, and a target recovery apparatus configured to recover the target output from the target supply device and not irradiated with the laser light. The target recovery apparatus may include a receiver disposed to be inclined with respect to a trajectory of the target output from the target supply device, the receiver being configured to receive the target by allowing the target not irradiated with the laser light to collide with the receiver, and an excitation device configured to vibrate the receiver.