EUV Target Supply Inert Gas Flow Path Design
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Solution Overview
Problem
Current EUV light generation apparatuses face challenges in efficiently managing target material distribution and inert gas flow, leading to target material scattering and potential blockages, which affect the generation and transmission of extreme ultraviolet light for semiconductor microfabrication processes.
Innovation Solution
A target supply device with a cylindrical tank, nozzle, and inert gas supply unit is designed, where the inert gas flow path is configured to guide gas obliquely against the tank's inner wall before colliding with the target material, reducing scattering and preventing material from entering the gas flow path, and incorporating features like shielding members and filters to prevent blockages.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If inert gas is supplied directly into the tank to control target material distribution, then target material scattering is reduced, but target material may enter the gas flow path and cause blockages
Solution Approach 1:
The gas flow path is extracted from the direct path into the tank and repositioned to penetrate the end portion of the tank. This separates the gas supply function from the target material storage space, allowing inert gas to flow along the inner wall without directly contacting the target material pool, thus preventing blockages while maintaining distribution control.
Solution Approach 2:
The inner wall of the tank serves as an intermediary surface between the inert gas flow and the target material. The gas flows along this intermediate surface, which mediates the interaction by directing gas flow parallel to the wall rather than directly into the material, preventing material from entering the flow path while still achieving distribution control.
2Manufacturing precision
If gas flow path is positioned close to target material to improve distribution control, then target material distribution is enhanced, but target material may solidify or react within the device
Solution Approach 1:
The inner wall acts as a protective intermediary between the inert gas flow path and the target material. This intermediate surface prevents direct contact between the gas flow and target material, eliminating the harmful effects of solidification and chemical reaction while maintaining close proximity for effective distribution control.
Solution Approach 2:
Inert gas is supplied through the flow path to create an inert atmosphere along the inner wall surface. This inert environment prevents unwanted chemical reactions between the target material and reactive gases, while the close positioning ensures effective distribution control without direct material-gas contact.
3Manufacturing precision
If inert gas flow rate is increased to prevent target material scattering, then scattering is reduced, but gas flow path blockages become more likely
Solution Approach 1:
The gas flow path is extracted from the direct material contact zone and repositioned to flow along the end portion and inner wall. This spatial separation allows higher gas flow rates to be used for scattering control without increasing the risk of blockages, since the gas no longer flows through the material pool where blockages would occur.
Solution Approach 2:
The gas flow is redirected from a vertical path through the material to a horizontal path along the inner wall surface. This dimensional change in flow direction allows higher flow rates to control scattering effectively while the horizontal flow path along the wall prevents material from blocking the gas flow.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the control of target material distribution, reduces scattering, and prevents material from solidifying or reacting within the device, ensuring consistent and unobstructed inert gas flow, thereby improving the efficiency of EUV light generation and reducing impurities.
Implementation Method 1
the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body
Data Source
AI summary
A target supply device may include: a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body; a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and an inert gas supply unit configured to supply inert gas into the tank, in which the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body.