EUV Target Supply Device Charge Neutralization

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Solution Overview

Problem

Current semiconductor production processes face challenges in achieving microfabrication with feature sizes of 32 nm or less due to limitations in EUV light generation systems, particularly in maintaining target material trajectory stability and charge neutrality during plasma generation.

Innovation Solution

A target supply device with a tank, first and second electrodes, and a charge neutralization unit is used to supply and neutralize the target material, ensuring proper trajectory and charge management by applying potentials and using thermoelectrons or electron/ion beams to prevent repulsive forces and trajectory shifts.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If target material is supplied to plasma generation region without charge neutralization, then target supply process is simple, but target material trajectory shifts due to charge-induced repulsive forces

Engineering Contradiction:
Improvetarget material trajectory stabilityVSAvoidcharge neutralization system complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent introduces a charge neutralization unit as an intermediary component between the target material supply system and the plasma generation region. This unit neutralizes the charge accumulated on target material droplets during flight, preventing trajectory shifts caused by repulsive forces. The charge neutralization unit includes electrodes that generate ions or electrons to counterbalance the charge on target droplets, thereby maintaining trajectory stability without requiring fundamental changes to the target supply mechanism.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If multiple electrodes with different potentials are used to control target material, then target trajectory control is improved, but device structure becomes more complex

Engineering Contradiction:
Improvetarget material positioning accuracyVSAvoidelectrode system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent divides the electrode system into multiple segmented electrodes (first electrode, second electrode, third electrode) with different functional roles. Each electrode is assigned a specific potential (first potential, second potential, third potential) to perform distinct functions: the first electrode generates the initial electric field, the second electrode controls droplet extraction timing, and the third electrode fine-tunes the trajectory. This segmentation allows precise control of target material positioning while maintaining manageable system complexity through modular functional division.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively stabilizes the target material trajectory and reduces charge-induced repulsive forces, enhancing the efficiency of EUV light generation and microfabrication processes by ensuring accurate and consistent target delivery to the plasma generation region.

Implementation Method 1

an electrostatic extraction section that extracts the target material in a melted state

Methodology Applied
Scientific EffectElectrostatic extraction: Electrostatics

Implementation Method 2

a first electrode disposed within the tank, a first potential setting unit configured to set a potential at the first electrode to a first potential, a second electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second potential setting unit configured to set a potential at the second electrode to a second potential that is different from the first potential

Methodology Applied
Scientific EffectElectric field acceleration: Electric Field

Implementation Method 3

a charge neutralization unit configured to neutralize a charge of target material that passes through a first region located between the second electrode and the plasma generation region

Methodology Applied
Scientific EffectCharge neutralization: Electrostatics

Data Source

PatentUS9125285B2Target supply device and EUV light generation chamber
Publication Date: 2015.09.01 GIGAPHOTON INC
  • US9125285B2 patent drawing
  • US9125285B2 patent drawing
  • US9125285B2 patent drawing

AI summary

A target supply device may include a tank including a nozzle, a first electrode disposed within the tank, a first potential setting unit configured to set a potential at the first electrode to a first potential, a second electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second potential setting unit configured to set a potential at the second electrode to a second potential that is different from the first potential, and a charge neutralization unit configured to neutralize a charge of the target material that passes through a first region located between the second electrode and the plasma generation region.