EUV Target Supply Device Temperature Control

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Solution Overview

Problem

Current extreme ultraviolet (EUV) light generating systems face challenges in maintaining stable droplet connection and EUV light emission due to variations in the vibration propagating path temperature, leading to unstable droplet formation and reduced EUV light quality.

Innovation Solution

The system incorporates a temperature adjusting mechanism to maintain a constant piezoelectric unit temperature and performs duty adjustment of the square wave electric signal to optimize droplet formation, using a chiller unit and heating/cooling devices to stabilize the vibration propagating path temperature, thereby increasing the number of usable duty values and improving droplet connection stability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the vibration propagating path temperature is not controlled, then the device complexity is reduced, but the droplet connection stability deteriorates

Engineering Contradiction:
Improvedroplet connection stabilityVSAvoidtemperature control mechanism
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies parameter changes by controlling the temperature of the vibration propagating path to stabilize droplet formation. By maintaining a constant temperature in the vibration propagating path, the system ensures consistent droplet connection stability without requiring complex active temperature control mechanisms, as the temperature control is integrated into the existing structural design.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If the piezoelectric unit temperature varies, then the ease of operation is improved, but the EUV light emission stability deteriorates

Engineering Contradiction:
ImproveEUV light emission stabilityVSAvoidtemperature adjustment
Core Design Contradiction:
ReliabilityVSEase of operation

Solution Approach 1:

The patent utilizes parameter changes by adjusting and maintaining the piezoelectric unit at a constant temperature to ensure stable EUV light emission. The temperature control mechanism is designed to automatically maintain the optimal temperature range, reducing the need for manual adjustments while ensuring consistent performance.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If the duty value is not optimized, then the device complexity is reduced, but the droplet formation quality deteriorates

Engineering Contradiction:
Improvedroplet formation qualityVSAvoidduty adjustment mechanism
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies parameter changes by optimizing the duty value of the electric signal driving the piezoelectric unit to achieve high-quality droplet formation. The system incorporates a duty adjustment mechanism that can be integrated into the control circuitry, allowing for precise control of droplet formation quality without significantly increasing overall device complexity.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach stabilizes droplet connection and EUV light emission by optimizing the temperature and duty values, resulting in a more robust and efficient EUV light generation process.

Implementation Method 1

a piezoelectric element 202; a vibration propagating path from the piezoelectric element 202 to the nozzle hole 80a

Methodology Applied
Scientific EffectPiezoelectric effect: Piezoelectric Effect

Implementation Method 2

a temperature adjusting mechanism configured to adjust, to a specified temperature, a temperature of a vibration propagating path member including at least part of the vibration propagating path

Methodology Applied
Scientific EffectThermal conduction: Conduction (thermal)

Implementation Method 3

irradiating a target substance with a laser beam to generate plasma from which extreme ultraviolet light is generated

Methodology Applied
Scientific EffectLaser ablation: Laser Ablation

Implementation Method 4

irradiating a target substance with a laser beam to generate plasma from which extreme ultraviolet light is generated

Methodology Applied
Scientific EffectPlasma emission: Plasma

Data Source

PatentUS11067907B2Target supply device, extreme ultraviolet light generating apparatus, and electronic device manufacturing method
Publication Date: 2021.07.20 GIGAPHOTON INC
  • US11067907B2 patent drawing
  • US11067907B2 patent drawing
  • US11067907B2 patent drawing

AI summary

A target supply device includes a vibrating element driven by a square wave electric signal and configured to generate a droplet of a target substance by vibrating the target substance to be output from a nozzle through a vibration propagating path; a temperature adjusting mechanism configured to adjust, to a specified temperature, a temperature of a vibration propagating path member including at least part of the vibration propagating path; a droplet detecting unit configured to output a signal containing information on a droplet detection interval indicating a time interval of droplets continuously generated; and a control unit configured to determine, based on the droplet detection interval, an operation specified temperature that is the specified temperature of the vibration propagating path member and an operation duty value that is a duty value of the electric signal used for driving the vibrating element when the droplet is irradiated with the laser beam.