EUV Lithography Tin Debris Ionization and Collection
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Solution Overview
Problem
Tin debris generated during Extreme Ultraviolet (EUV) lithography processes adversely affects the performance and efficiency of EUV apparatus, leading to increased repair costs and productivity losses due to contamination on the collector and masks.
Innovation Solution
The implementation of a supplemental laser source to ionize tin debris and a magnetic field to direct the ionized particles towards a heater for collection, reducing contamination on the EUV vessel and masks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Use of energy by moving object
If laser-generated plasma is used to produce EUV light, then EUV lithography can be performed, but tin debris is generated that contaminates the collector and masks
Solution Approach 1:
The patent applies magnetic fields to capture and remove the harmful tin debris that is inherently generated during EUV light production. By converting the harmful contamination into a removable component, the system maintains continuous operation without the debris affecting performance
Solution Approach 2:
The patent extracts and removes the harmful tin debris from the system using magnetic fields and debris collection mechanisms. This separation allows the EUV light production to continue while the contaminants are actively removed before they can damage critical components
2Productivity
If EUV lithography operates continuously, then productivity increases, but tin debris accumulates on the collector and masks requiring repairs
Solution Approach 1:
The patent implements continuous debris removal through magnetic fields and active collection systems that operate throughout the lithography process. This allows the EUV lithography to maintain continuous operation without interruption for cleaning or repairs
Solution Approach 2:
The system uses sensors to monitor debris levels and adjusts magnetic field strength and collection mechanisms accordingly. This feedback control ensures debris is removed before it reaches critical thresholds that would require system shutdown or repairs
3Object-generated harmful factors
If magnetic fields are used to direct ionized particles, then tin debris is reduced, but additional system complexity is introduced
Solution Approach 1:
The magnetic fields serve multiple functions: they ionize the tin debris, direct the ionized particles toward collection mechanisms, and work in conjunction with existing vacuum and pumping systems. This multi-functionality reduces the need for entirely separate subsystems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces tin contamination, lowers repair costs, and enhances the efficiency of the EUV tool by minimizing tin debris accumulation and associated defects in semiconductor manufacturing.
Implementation Method 1
A supplemental laser source produces a laser pulse that heats the tin particles to a temperature sufficient to ionize the tin particles
Implementation Method 2
An electromagnet produces a magnetic field that directs the ionized particles to the heater
Data Source
AI summary
A method for extreme ultraviolet (EUV) lithography includes generating target droplets and using a first laser source to generate laser pulses to heat the target droplets to generate extreme ultraviolet (EUV) light and a plurality of particles. The method also includes using a supplemental laser source to generate laser pulses to ionize the plurality of particles, applying a magnetic field to direct ionized particles to debris collection device, and capturing the ionized particles by the debris collection device.