EUV Tin Debris Recycling for Collector Protection and Feed Purity

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Solution Overview

Problem

The collector in extreme ultraviolet (EUV) lithography systems, particularly those using laser-produced plasma (LPP) sources, faces damage and degradation due to particle, ion, radiation, and tin debris impact, leading to frequent maintenance needs and reduced efficiency.

Innovation Solution

Implementing a tin reuse system where collected tin debris is recycled and reused, utilizing heated tin vane buckets and tin droplet catchers to feed back into the droplet generator, reducing the frequency of refilling and maintenance, and employing debris collection mechanisms to prevent contamination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Illumination intensity

If a laser-produced plasma (LPP) source is used to generate EUV light, then EUV radiation is produced with peak maximum emission at 13.5 nm, but the collector is subjected to damage and degradation due to particle, ion, radiation, and tin deposition impact

Engineering Contradiction:

ImproveEUV radiation emissionVSAvoidcollector durability

Core Design Contradiction:

Illumination intensityVSReliability

Solution Approach 1:

The patent recycles tin debris that would otherwise damage the collector by capturing it with tin catchers and feeding it back to the droplet generator. This converts the harmful tin deposition into a beneficial resource, reducing collector degradation while maintaining EUV radiation production.

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Solution Approach 2:

The system implements recovery of tin material through tin catchers positioned to capture tin debris before it reaches the collector. The recovered tin is then reused in the droplet generator, preventing waste and reducing the need for frequent refilling while protecting the collector from damage.

Inventive Principle:

Principle #34Discarding and recovering

2Productivity

If the collector is exposed to tin deposition and particle impact, then EUV light production continues, but maintenance frequency increases and service intervals decrease

Engineering Contradiction:

ImproveEUV light production continuityVSAvoidmaintenance downtime

Core Design Contradiction:

ProductivityVSLoss of time

Solution Approach 1:

The tin recycling system operates continuously, capturing tin debris as it is produced and immediately feeding it back to the droplet generator. This continuous operation maintains EUV light production without interruption while simultaneously protecting the collector, eliminating downtime associated with manual refilling and maintenance.

Inventive Principle:

Principle #20Continuity of useful action

Solution Approach 2:

The system performs self-maintenance by automatically capturing and recycling tin debris through the tin catcher and feed mechanism. This self-service approach reduces the need for external intervention and manual maintenance, keeping the system productive while minimizing service intervals.

Inventive Principle:

Principle #25Self-service

3Productivity

If tin droplet generator is continuously operated, then EUV radiation source efficiency is maintained, but the generator becomes clogged with tin debris

Engineering Contradiction:

ImproveEUV radiation source efficiencyVSAvoidtin debris clogging

Core Design Contradiction:

ProductivityVSObject-generated harmful factors

Solution Approach 1:

The system implements a feedback loop where tin debris captured by the tin catchers is fed back to the droplet generator. This feedback mechanism ensures continuous operation by replenishing the tin supply, preventing clogging while maintaining EUV radiation source efficiency.

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

The system changes the state of tin debris from a harmful contaminant to a useful resource by altering its position and form. Tin debris is captured, melted in the tin catcher, and re-fed as liquid tin to the generator, changing parameters from solid debris to liquid feed material, preventing clogging while maintaining productivity.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach decreases downtime and prevents clogging of the tin droplet generator, enhancing the EUV radiation source's operational efficiency and extending its service intervals by recycling tin and effectively managing debris.

Implementation Method 1

LPP technology produces EUV light by focusing a high-power laser beam onto small tin droplet targets to form highly ionized plasma that emits EUV radiation with a peak maximum emission at 13.5 nm

Methodology Applied

Scientific EffectLaser-produced plasma: Plasma

Implementation Method 2

focusing a high-power laser beam onto small tin droplet targets to form highly ionized plasma

Methodology Applied

Scientific EffectLaser ablation: Laser Ablation

Implementation Method 3

The EUV light is then collected by a LPP collector and reflected by optics towards a lithography target

Methodology Applied

Scientific EffectReflection: Reflection

Data Source

PatentUS11470710B2EUV light source and apparatus for EUV lithography

Publication Date: 2022.10.11 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD

AI summary

A metal reuse system for an extreme ultra violet (EUV) radiation source apparatus includes a first metal collector for collecting metal from vanes of the EUV radiation source apparatus, a first metal storage coupled to the first metal collector via a first conduit, a metal droplet generator coupled to the first metal storage via a second conduit, and a first metal filtration device disposed on either one of the first conduit and the second conduit.