EUV Top Module Shielding Gas Flow Control

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Solution Overview

Problem

In exposing apparatuses using extreme ultraviolet (EUV) light, the radial diffusion of shielding gases can contaminate the reticle, leading to inaccurate pattern transfer onto semiconductor substrates.

Innovation Solution

A top module with a reticle stage, nozzle, and guides is designed to inject shielding gas in a horizontal direction, with the guides extending from the nozzle to induce the gas in the same direction, preventing radial diffusion and contamination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If shielding gas is injected to prevent reticle contamination, then reticle protection is improved, but radial diffusion of shielding gas causes contamination

Engineering Contradiction:

Improvereticle contaminationVSAvoidshielding gas diffusion

Core Design Contradiction:

Object-affected harmful factorsVSObject-generated harmful factors

Solution Approach 1:

The shielding gas injection system is segmented into multiple nozzles positioned at different locations (front, rear, and side nozzles) around the reticle. Each nozzle injects shielding gas in a specific direction to create a comprehensive protective atmosphere without radial diffusion, thereby preventing reticle contamination while controlling gas flow directionality

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Different regions around the reticle receive shielding gas with different flow characteristics through specifically positioned nozzles. The front and rear nozzles provide axial flow protection, while side nozzles provide lateral protection, creating locally optimized shielding quality in each region to prevent contamination without causing radial diffusion

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration ensures that the shielding gas flows along the intended path, preventing contamination of the reticle and allowing for accurate pattern transfer from the reticle to the semiconductor substrate.

Implementation Method 1

The nozzle may be under the reticle stage and configured to inject a shielding gas in a first horizontal direction

Methodology Applied

Scientific EffectGas flow:

Implementation Method 2

The guides may extend from opposite sides of the nozzle and may be configured to induce the shielding gas in the first horizontal direction

Methodology Applied

Scientific EffectFluid induction:

Data Source

PatentUS20250021008A1Top module and exposing apparatus including the same

Publication Date: 2025.01.16 SAMSUNG ELECTRONICS CO LTD

AI summary

A top module of an exposing apparatus may include a reticle stage, a nozzle and a pair of guides. The reticle stage may be configured to support a reticle to which a light is incident. The nozzle may be under the reticle stage and configured to inject a shielding gas in a first horizontal direction. The guides may extend from opposite sides of the nozzle and may be configured to induce the shielding gas in the first horizontal direction. Thus, the shielding gas may not diffuse in a second horizontal direction (e.g., perpendicular to the first horizontal direction) to prevent a diffusion of a contaminant in the shielding gas, thereby preventing the reticle from being contaminated. As a result, a pattern of the reticle may be accurately transcribed into a layer on a semiconductor substrate to form a desired pattern.