EUV Light Homogenizer Tunnel with Diffusion Barrier Tube
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Solution Overview
Problem
Current systems for controlling particle and chemical contamination in extreme ultra-violet (EUV) light systems, used in semiconductor manufacturing, are inadequate as they either provide insufficient protection, require excessive gas flow, or are costly due to the need for large pumping systems, and lack the ability to adjust gas supply based on individual system requirements.
Innovation Solution
The apparatus includes a light homogenizer tunnel and a diffusion barrier tube with a sintered gas diffuser, allowing for controlled gas flow in both directions to minimize contamination, with the option to customize gas flow rates and pressures to optimize protection factors, and can be designed to supply different gas amounts to the plasma generation site and optical element based on specific needs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If high-velocity gas jets are used to protect optical elements from contamination, then particle and chemical protection is improved, but gas flow requirements increase leading to larger and more expensive pumping systems
Solution Approach 1:
The patent introduces a gas curtain that creates a localized protective barrier precisely at the optical element surface, rather than requiring high-velocity gas flow throughout the entire optical path. This localized approach provides effective contamination protection while significantly reducing the total gas flow requirement and pumping system size
Solution Approach 2:
The gas curtain acts as an intermediary barrier between the contamination source and the optical element. By introducing a controlled gas flow that forms a protective curtain, the system intercepts contaminants before they reach the optical surface, reducing the need for high-velocity jets and large pumping systems
2Device complexity
If uniform gas flow is supplied to all areas, then simplicity of gas distribution is improved, but inability to meet individual requirements of plasma generation site and optical element deteriorates
Solution Approach 1:
The gas distribution system is segmented into multiple independent gas inlets, each capable of supplying gas to different areas with different flow rates. This allows the plasma generation site and optical element to receive customized gas flow according to their individual contamination protection requirements, while maintaining relatively simple system architecture
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces contamination by achieving high protection factors against both chemical and particle contaminants, while minimizing the impact on EUV light propagation and reducing operational costs by optimizing gas usage, allowing for customizable protection tailored to the specific requirements of the EUV system.
Implementation Method 1
a sintered gas diffuser located between the light homogenizer tunnel and the diffusion barrier tube and arranged to introduce a gas into the enclosed space such that the gas flows in a first direction toward the light homogenizer tunnel and in a second direction toward the second end
Implementation Method 2
an enclosed space connecting the first and second ends and arranged to reflect light from the EUV light source
Data Source
AI summary
An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, a fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.