Evaporation Cover for Shaping System Residual Layer Thickness

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Solution Overview

Problem

Existing planarization and imprint techniques face challenges in minimizing the evaporation of formable material during the transfer of a substrate from a dispensing station to a planarizing or imprinting station, leading to deviations from the target residual layer thickness.

Innovation Solution

A shaping system and method that involve a cover with walls positioned to enclose the substrate and dispensed formable material, maintaining a ratio of substrate diameter to cover distance between 80:1 to 30:1, and optionally using a porous pad within the cover to prevent evaporation, ensuring the formable material is kept in a saturated environment during transfer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the substrate is moved from the dispensing station to the planarizing/imprint station without enclosure, then the transfer process is simple and fast, but the formable material evaporates leading to deviation from target residual layer thickness

Engineering Contradiction:
Improveresidual layer thicknessVSAvoidsystem complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

A cover is positioned over the substrate to enclose the formable material during transfer from the dispensing station to the planarizing/imprint station. The cover creates a confined space that prevents evaporation of the formable material, ensuring the residual layer thickness remains at the target value without adding complex enclosure systems

Inventive Principle:
Principle #30Flexible shells and thin films

Solution Approach 2:

The cover acts as an intermediary element between the dispensing station and the planarizing/imprint station, providing a protected transfer path that isolates the formable material from the ambient environment during transportation

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If a cover is added to enclose the substrate during transfer, then evaporation of formable material is reduced, but the device complexity increases

Engineering Contradiction:
Improveresidual layer thickness consistencyVSAvoidnumber of components
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The cover is designed as a simple enclosing structure that can be easily positioned and removed, providing evaporation protection without adding significant complexity to the overall system architecture

Inventive Principle:
Principle #30Flexible shells and thin films

Solution Approach 2:

The cover system is designed to be self-contained and easy to operate, requiring minimal additional mechanisms or controls beyond the basic positioning and movement capabilities already present in the system

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach effectively minimizes evaporation of the formable material during transfer, maintaining the target residual layer thickness and improving the consistency of the planarization or imprinting process.

Implementation Method 1

a cover positioned to enclose the substrate and the dispensed formable material while the substrate having the dispensed formable material is being moved from the dispensing station to the planarizing/imprint station

Methodology Applied
Scientific EffectEvaporation prevention: Physical Containment

Implementation Method 2

a porous pad disposed inside the cover while the cover encloses the substrate and the dispensed formable material

Methodology Applied
Scientific EffectAbsorption: Absorption (physical)

Data Source

PatentUS11951660B2Shaping system including an evaporation cover, shaping process, and method of manufacturing an article
Publication Date: 2024.04.09 CANON KK
  • US11951660B2 patent drawing
  • US11951660B2 patent drawing
  • US11951660B2 patent drawing

AI summary

A shaping system comprises a dispensing station configured to dispense formable material on a substrate, a shaping station configured to contact the dispensed formable material on the substrate with a plate, a positioning system configured to move the substrate having the dispensed formable material from the dispensing system to the shaping station, and a cover having one or more walls. While the substrate having the dispensed formable material is moved by the positioning system from the dispensing station to the shaping station, the cover is positioned to enclose the substrate and the dispensed formable material such that a ratio of a diameter of the substrate to a distance between the cover and the substrate to 80:1 to 30:1.