Evaporation Mask Frame with Stepped Planes for Substrate Protection
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Solution Overview
Problem
The evaporation process in coating electronic devices is prone to substrate edge scratching due to the relative motion between mask strips and glass substrates, leading to peripheral circuit breakage and reduced product yield, which is difficult to mitigate with existing edge control and motion slowing methods.
Innovation Solution
A mask design featuring a frame with two planes of different heights, where first mask strips are lapped over the outer frame, preventing direct contact with the inner frame and allowing increased freedom of motion to reduce scratching, while second mask strips are arranged to ensure uniform film deposition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the thickness of mask strips is reduced to 100μm or less to ensure flatness in contact with glass substrate, then flatness requirement is met, but edges of mask strips become sharp causing substrate scratching
Solution Approach 1:
The patent introduces a vertical height dimension by providing the frame with a first surface higher than a second surface, creating a stepped structure. This dimensional change allows mask strips to be positioned at different heights, with some strips extending above the first surface to prevent edge scratching while maintaining contact flatness through the stepped frame design.
Solution Approach 2:
The frame structure acts as an intermediary between the mask strips and the glass substrate. By providing a stepped frame with different surface heights, it mediates the contact between mask strip edges and the substrate, allowing the higher first surface to support mask strips that prevent scratching while the overall frame maintains flat contact.
2Object-affected harmful factors
If the relative motion between mask strips and glass substrate is slowed down to reduce scratching, then substrate damage is reduced, but manufacturing efficiency is lowered
Solution Approach 1:
The patent applies preliminary anti-action by designing the frame with a higher first surface that extends beyond the mask strips before contact with the substrate occurs. This pre-positioned structural feature prevents edge scratching proactively without requiring slowing down the relative motion between mask strips and substrate during the evaporation process.
3Object-affected harmful factors
If mask strips are positioned to prevent edge scratching, then substrate protection is improved, but film deposition uniformity may be affected
Solution Approach 1:
The patent applies local quality by creating different surface heights at different locations of the frame. The first surface is positioned higher to specifically address edge protection needs, while other portions of the frame maintain appropriate heights for film deposition uniformity. This localized structural variation allows simultaneous achievement of substrate protection and deposition quality.
Data Source
Figure 1
Figure 2~2b
Figure 3~3a
AI summary
A mask and an evaporation device. The mask (100) includes a frame (101) and a first mask strip (1021) disposed inside the frame (101); the frame (101) includes an outer frame (1011) and an inner frame (1012); the outer frame (1011) is disposed on the outer side and includes a first plane (103); the inner frame (1012) is disposed on the inner side and includes a second plane (104); the first plane (103) is higher than the second plane (104), so as to form a step (105); the first mask strip (1021) is fixed on the outer frame (1011) through two ends and extended in the outer frame (1011) along one side of the frame (101); and an orthographic projection of the first mask strip (1021) on the second plane (104) is at least partially overlapped with the inner frame (1012) on the one side. The mask (100) changes the design of the frame (101) and the mask strips (1021, 1022) fixed thereon and therefore can effectively solve the problem of the scratching of a glass substrate and effectively improves the yield and the service life of subsequent products.