Evaporation Source Device with Segmented Vacuum Box and Shutter
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Solution Overview
Problem
Existing evaporation source devices in OLED technology suffer from uncontrollable gas flow during the evaporation process, leading to a decrease in vacuum chamber quality, material splashing, and increased roughness of the thin film due to uneven reactions.
Innovation Solution
An evaporation source device with a vacuum chamber, pedestal, and control valve system, where a crucible is placed in a vacuum box connected to a control valve with opposing nozzles, allowing precise control of gas flow and preventing material splashing by directing the evaporation source into the vacuum chamber through the control valve.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If continuous heating is applied to generate evaporation source, then evaporation rate increases, but gas flow becomes uncontrollable and material evaporates too fast
Solution Approach 1:
The vacuum chamber is divided into a reaction chamber and a deposition chamber separated by a shutter. The reaction chamber contains the crucible for material evaporation, while the deposition chamber receives the evaporated material. This segmentation allows independent control of heating and deposition processes, enabling high evaporation rates without compromising vacuum quality in the deposition area.
Solution Approach 2:
The shutter is closed before initiating material evaporation to pre-establish a vacuum barrier. By closing the shutter in advance, the system prepares the deposition chamber for receiving evaporated material while maintaining vacuum separation, preventing gas flow from the high-temperature reaction chamber from degrading the vacuum in the deposition chamber.
2Productivity
If heating power is increased to improve evaporation efficiency, then productivity increases, but material splashes and vacuum degree decreases
Solution Approach 1:
The system segments the heating process from the deposition process using a physical shutter barrier. The reaction chamber where high-power heating occurs is separated from the deposition chamber, allowing aggressive heating without material splash affecting the deposited film quality. The shutter prevents splashed material from contaminating the deposition area.
Solution Approach 2:
The shutter acts as an intermediary barrier between the high-energy reaction chamber and the deposition chamber. It mediates the transfer of evaporated material while blocking harmful splashes and excessive gas flow, enabling high evaporation efficiency without compromising vacuum quality or film uniformity.
3Productivity
If evaporation rate is increased to reduce processing time, then productivity improves, but white particles form and thin film roughness increases
Solution Approach 1:
The reaction and deposition chambers are segmented with a shutter, allowing the reaction chamber to operate at high evaporation rates for reduced processing time while the deposition chamber maintains controlled conditions for smooth film formation. The shutter ensures that only properly evaporated material reaches the substrate.
Solution Approach 2:
The shutter is closed preliminarily to establish a controlled deposition environment before material arrival. This pre-preparation ensures that even at high evaporation rates, the deposition chamber maintains optimal vacuum and temperature conditions for smooth film formation without white particle contamination.
4Adaptability or versatility
If vacuum chamber volume is increased to accommodate larger substrates, then adaptability improves, but vacuum maintenance becomes more difficult
Solution Approach 1:
The vacuum system is segmented into two independent chambers: a reaction chamber for material evaporation and a deposition chamber for substrate coating. Each chamber can be independently evacuated and maintained at appropriate vacuum levels. This allows the deposition chamber to be optimized for large substrate capacity while the reaction chamber handles the demanding evaporation process.
Solution Approach 2:
The shutter serves as an intermediary barrier that isolates the two vacuum chambers. It prevents pressure equalization between chambers, allowing the deposition chamber to maintain a large volume suitable for big substrates while the reaction chamber maintains the aggressive vacuum conditions needed for high-rate evaporation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures uniform material reaction, maintains a stable vacuum environment, prevents material splashing, and improves the quality and smoothness of the coating film by controlling the evaporation rate and reducing white particle formation.
Implementation Method 1
an evaporation source device generates heat by energizing a heating source
Implementation Method 2
heating a crucible and a material placed in the crucible
Implementation Method 3
heating and gasifying a crucible and a material placed in the crucible to form an evaporation source; the evaporation source is deposited as a thin film
Implementation Method 4
the first nozzle communicates with the vacuum box, and the second nozzle communicates with the vacuum chamber
Data Source
AI summary
An evaporation source device is provided by the present application. The evaporation source device includes a vacuum chamber, and a pedestal, at least one vacuum box, and at least one control valve that are disposed in the vacuum chamber; and the at least one vacuum box is disposed on the pedestal, and a crucible is disposed in the vacuum box; the vacuum box is connected with the control valve; wherein the control valve includes a first nozzle and a second nozzle disposed oppositely, the first nozzle communicates with the vacuum box, and the second nozzle communicates with the vacuum chamber.