Evaporation Substrate Support Pattern for Mask Stability

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Solution Overview

Problem

The existing evaporation process for OLED display panels has a poor evaporation effect due to inadequate support during the formation of light-emitting functional layers, leading to non-uniform thickness and efficiency issues.

Innovation Solution

A to-be-evaporated substrate with a support pattern featuring symmetrical arrangements of supporters along the perimeter of the evaporation region, which improves uniformity and evaporation efficiency by supporting the mask during the evaporation process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a Fine Metal Mask (FMM) is used to form light-emitting functional layers during evaporation, then material can be evaporated to a set position, but the evaporation effect is poor due to inadequate support

Engineering Contradiction:
Improveevaporation precisionVSAvoidsupport stability
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The support pattern is segmented into multiple discrete supporters (first supporters, second supporters, third supporters, fourth supporters) positioned at specific locations around the to-be-evaporated region. This segmentation provides distributed support points that collectively stabilize the FMM during evaporation, addressing the inadequate support issue while maintaining evaporation precision.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The support pattern is pre-formed on the substrate before the evaporation process begins. This preliminary action ensures that the FMM has stable support structures in place before material deposition, preventing support instability during the evaporation process and ensuring consistent evaporation precision.

Inventive Principle:
Principle #10Preliminary action

2Manufacturing precision

If supporters are arranged along the perimeter of the to-be-evaporated region, then support uniformity is improved, but device complexity increases

Engineering Contradiction:
Improvethickness uniformityVSAvoidsupport pattern complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

Different types of supporters (first, second, third, fourth supporters) are positioned asymmetrically at different locations around the to-be-evaporated region, with each type having specific positional relationships to the to-be-evaporated region and to each other. This asymmetric arrangement optimizes support uniformity for the evaporation process while managing the complexity through functional differentiation rather than uniform repetition.

Inventive Principle:
Principle #4Asymmetry

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The support pattern enhances the thickness uniformity and evaporation effect of the film layer, resulting in improved display substrate performance.

Implementation Method 1

OLED display panels are mainly manufactured by evaporation

Methodology Applied
Scientific EffectEvaporation: Evaporation

Implementation Method 2

a mask is supported by a support pattern. A plurality of supporters in the support pattern are arranged along a perimeter of a to-be-evaporated region

Methodology Applied
Scientific EffectPhysical Vapour Deposition: Physical Vapour Deposition

Data Source

PatentUS20240365652A1To-be-evaporated substrates, display substrates and manufacturing methods thereof
Publication Date: 2024.10.31 CHENGDU BOE OPTOELECTRONICS TECH CO LTD
  • US20240365652A1 patent drawing
  • US20240365652A1 patent drawing
  • US20240365652A1 patent drawing

AI summary

The present disclosure provides a to-be-evaporated substrate, a display substrate and a method of manufacturing a display substrate. The to-be-evaporated substrate may include: a substrate including a to-be-evaporated region and a non-evaporated region, where the non-evaporated region surrounds the to-be-evaporated region; a support pattern, disposed on the substrate and located in the non-evaporated region, where the support pattern includes a plurality of supporters for supporting a mask and further includes a first symmetrical pattern formed by a plurality of supporters, and the plurality of supporters forming the first symmetrical pattern are arranged along a perimeter of the to-be-evaporated region. The present disclosure can improve evaporation effect.